Wang Hao, Xu Xiaojie, Shaymurat Talgar
Key Laboratory of New Energy and Materials Research, Xinjiang Institute of Engineering, Urumqi 830023, China.
Xinjiang Condensed Matter Phase Transition and Microstructure Laboratory, College of Physics Science and Technology, Yili Normal University, Yining 835000, China.
Nanomaterials (Basel). 2022 Dec 18;12(24):4485. doi: 10.3390/nano12244485.
Grinding-assisted liquid-phase exfoliation is a widely used method for the preparation of two-dimensional nanomaterials. In this study, N-methylpyrrolidone and acetonitrile, two common grinding solvents, were used during the liquid-phase exfoliation for the preparation of MoS nanosheets. The morphology and structure of MoS nanosheets were analyzed via scanning electron microscopy, X-ray diffraction, and Raman spectroscopy. The effects of grinding solvents on the gas-sensing performance of the MoS nanosheets were investigated for the first time. The results show that the sensitivities of MoS nanosheet exfoliation with N-methylpyrrolidone were 2.4-, 1.4-, 1.9-, and 2.7-fold higher than exfoliation with acetonitrile in the presence of formaldehyde, acetone, and ethanol and 98% relative humidity, respectively. MoS nanosheet exfoliation with N-methylpyrrolidone also has fast response and recovery characteristics to 50-1000 ppm of CHO. Accordingly, although N-methylpyrrolidone cannot be removed completely from the surface of MoS, it has good gas sensitivity compared with other samples. Therefore, N-methylpyrrolidone is preferred for the preparation of gas-sensitive MoS nanosheets in grinding-assisted liquid-phase exfoliation. The results provide an experimental basis for the preparation of two-dimensional materials and their application in gas sensors.
研磨辅助液相剥离是制备二维纳米材料广泛使用的方法。在本研究中，在液相剥离制备MoS纳米片的过程中使用了两种常见的研磨溶剂N-甲基吡咯烷酮和乙腈。通过扫描电子显微镜、X射线衍射和拉曼光谱对MoS纳米片的形貌和结构进行了分析。首次研究了研磨溶剂对MoS纳米片气敏性能的影响。结果表明，在甲醛、丙酮、乙醇和98%相对湿度存在的情况下，用N-甲基吡咯烷酮剥离的MoS纳米片的灵敏度分别比用乙腈剥离的高2.4倍、1.4倍、1.9倍和2.7倍。用N-甲基吡咯烷酮剥离的MoS纳米片对50 - 1000 ppm的CHO也具有快速响应和恢复特性。因此，尽管N-甲基吡咯烷酮不能完全从MoS表面去除，但与其他样品相比它具有良好的气敏性。所以，在研磨辅助液相剥离中制备气敏MoS纳米片时N-甲基吡咯烷酮是首选。这些结果为二维材料的制备及其在气体传感器中的应用提供了实验依据。
