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采用干法转移透明碳纳米管电极实现高灵敏度 MoS 光电探测器。

Highly Sensitive MoS Photodetectors Enabled with a Dry-Transferred Transparent Carbon Nanotube Electrode.

机构信息

Department of Electronics and Nanoengineering, School of Electrical Engineering, Aalto University, EspooFI-02150, Finland.

Department of Applied Physics, School of Science, Aalto University, EspooFI-02150, Finland.

出版信息

ACS Appl Mater Interfaces. 2023 Jan 25;15(3):4216-4225. doi: 10.1021/acsami.2c19917. Epub 2023 Jan 12.

DOI:10.1021/acsami.2c19917
PMID:36635093
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC9880956/
Abstract

Fabricating electronic and optoelectronic devices by transferring pre-deposited metal electrodes has attracted considerable attention, owing to the improved device performance. However, the pre-deposited metal electrode typically involves complex fabrication procedures. Here, we introduce our facile electrode fabrication process which is free of lithography, lift-off, and reactive ion etching by directly press-transferring a single-walled carbon nanotube (SWCNT) film. We fabricated Schottky diodes for photodetector applications using dry-transferred SWCNT films as the transparent electrode to increase light absorption in photoactive MoS channels. The MoS flake vertically stacked with an SWCNT electrode can exhibit excellent photodetection performance with a responsivity of ∼2.01 × 10 A/W and a detectivity of ∼3.2 × 10 Jones. Additionally, we carried out temperature-dependent current-voltage measurement and Fowler-Nordheim (FN) plot analysis to explore the dominant charge transport mechanism. The enhanced photodetection in the vertical configuration is found to be attributed to the FN tunneling and internal photoemission of charge carriers excited from indium tin oxide across the MoS layer. Our study provides a novel concept of using a photoactive MoS layer as a tunneling layer itself with a dry-transferred transparent SWCNT electrode for high-performance and energy-efficient optoelectronic devices.

摘要

通过转移预先沉积的金属电极来制造电子和光电设备引起了相当大的关注,因为这可以提高设备性能。然而,预先沉积的金属电极通常涉及复杂的制造工艺。在这里,我们介绍了一种简便的电极制造工艺,该工艺无需光刻、剥离和反应离子刻蚀,而是通过直接压印转移单壁碳纳米管 (SWCNT) 薄膜来实现。我们使用干式转移的 SWCNT 薄膜作为透明电极制造肖特基二极管,用于光电探测器应用,以增加光活性 MoS 沟道的光吸收。MoS 薄片与 SWCNT 电极垂直堆叠,可以表现出优异的光电探测性能,响应率约为 2.01×10 A/W,探测率约为 3.2×10 琼斯。此外,我们进行了温度相关的电流-电压测量和 Fowler-Nordheim(FN)图分析,以探索主要的电荷传输机制。发现垂直结构中增强的光电探测归因于从氧化铟锡穿过 MoS 层激发的载流子的 FN 隧穿和内光电发射。我们的研究提供了一个新的概念,即使用光活性 MoS 层作为自身的隧穿层,并使用干式转移的透明 SWCNT 电极来制造高性能、节能的光电设备。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/71eb/9880956/bc51e5ef7e71/am2c19917_0006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/71eb/9880956/33f5ac67e80f/am2c19917_0002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/71eb/9880956/30ecec775eb5/am2c19917_0003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/71eb/9880956/0b7714836a39/am2c19917_0004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/71eb/9880956/ce14503e9db5/am2c19917_0005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/71eb/9880956/bc51e5ef7e71/am2c19917_0006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/71eb/9880956/33f5ac67e80f/am2c19917_0002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/71eb/9880956/30ecec775eb5/am2c19917_0003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/71eb/9880956/0b7714836a39/am2c19917_0004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/71eb/9880956/ce14503e9db5/am2c19917_0005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/71eb/9880956/bc51e5ef7e71/am2c19917_0006.jpg

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