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用于超光滑单晶硅的高效化学机械磁流变抛光

High-Efficiency Chemical-Mechanical Magnetorheological Finishing for Ultra-Smooth Single-Crystal Silicon.

作者信息

Lin Zhifan, Hu Hao, Dai Yifan, Zhong Yaoyu, Xue Shuai

机构信息

Laboratory of Science and Technology on Integrated Logistics Support, National University of Defense Technology, Changsha 410073, China.

College of Intelligence Science and Technology, National University of Defense Technology, Changsha 410073, China.

出版信息

Nanomaterials (Basel). 2023 Jan 18;13(3):398. doi: 10.3390/nano13030398.

Abstract

To improve the material removal efficiency and surface quality of single-crystal silicon after magnetorheological finishing, a novel green chemical-mechanical magnetorheological finishing (CMMRF) fluid was developed. The main components of the CMMRF fluid are nano-FeO, HO, CHCOOH, nanodiamond, carbonyl iron powder, and deionized water. The novel CMMRF fluid can simultaneously achieve Ra 0.32 nm (0.47 mm × 0.35 mm measurement area), Ra 0.22 nm (5 μm × 5 μm measurement area), and 1.91 × 10 mm/min material removal efficiency. Comprehensive studies utilizing a scanning electron microscope and a magnetic rheometer show that the CMMRF fluid has a high mechanical removal effect due to the well-dispersed nanodiamond and nano-FeO particles. The results of Fourier transform infrared spectra and Young's modulus test reveal the mechanism of the chemical reaction and the mechanical characteristics deterioration of the modified layer. Under co-enhanced chemical and mechanical effects, an ultra-smooth and highly efficient MRF technology for single-crystal silicon is realized.

摘要

为提高磁流变抛光后单晶硅的材料去除效率和表面质量,开发了一种新型绿色化学机械磁流变抛光(CMMRF)液。CMMRF液的主要成分是纳米FeO、HO、CHCOOH、纳米金刚石、羰基铁粉和去离子水。这种新型CMMRF液能同时实现Ra 0.32纳米(测量面积0.47毫米×0.35毫米)、Ra 0.22纳米(测量面积5微米×5微米)以及1.91×10毫米/分钟的材料去除效率。利用扫描电子显微镜和磁流变仪进行的综合研究表明,由于纳米金刚石和纳米FeO颗粒分散良好,CMMRF液具有较高的机械去除效果。傅里叶变换红外光谱和杨氏模量测试结果揭示了化学反应机理以及改性层的机械性能劣化情况。在化学和机械协同增强作用下,实现了用于单晶硅的超光滑高效磁流变抛光技术。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b48a/9919215/aae0ff6694de/nanomaterials-13-00398-g001.jpg

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