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(钐,铟)掺杂对锑碲微结构电学和热学性能的影响。

Effect of (Sm, In) Doping on the Electrical and Thermal Properties of SbTe Microstructures.

作者信息

Komal Nitasha, Mansoor Muhammad Adil, Mazhar Muhammad, Sohail Manzar, Malik Zahida, Anis-Ur-Rehman Muhammad

机构信息

Department of Chemistry, School of Natural Sciences (SNS), National University of Sciences and Technology (NUST), H-12, Islamabad44000, Pakistan.

Applied Thermal Physics Laboratory, Department of Physics, COMSATS University Islamabad, Islamabad44000, Pakistan.

出版信息

ACS Omega. 2023 Mar 10;8(11):9797-9806. doi: 10.1021/acsomega.2c05859. eCollection 2023 Mar 21.

Abstract

Doped SbTe narrow-band-gap semiconductors have been attracting considerable attention for different electronic and thermoelectric applications. Trivalent samarium (Sm)- and indium (In)-doped SbTe microstructures have been synthesized by the economical solvothermal method. Powder X-ray diffraction (PXRD) was used to verify the synthesis of single-phase doped and undoped SbTe and doping of Sm and In within the crystal lattice of SbTe. Further, the morphology, structure elucidation, and stability have been investigated systematically by scanning electron microscopy (SEM), Raman analysis, and thermogravimetric analysis (TGA). These analyses verified the successful synthesis of hexagonal undoped SbTe (AT) and (Sm, In)-doped SbTe (SAT, IAT) microstructures. Moreover, the comparison of dielectric parameters, including dielectric constant, dielectric loss, and tan loss of AT, SAT, and IAT, was done in detail. An increment in the electrical conductivities, both AC and DC, from 1.92 × 10 to 4.9 × 10 Ω m and a decrease in thermal conductivity (0.68-0.60 W m K) were observed due to the doping by trivalent (Sm, In) dopants. According to our best knowledge, the synthesis and dielectric properties of (Sm, In)-doped and undoped SbTe in comparison with their electrical properties and thermal conductivity have not been reported earlier. This implies that appropriate doping with (Sm, In) in SbTe is promising to enhance the electronic and thermoelectric behavior.

摘要

掺杂的SbTe窄带隙半导体因其在不同电子和热电应用中的表现而备受关注。采用经济的溶剂热法合成了三价钐(Sm)和铟(In)掺杂的SbTe微结构。利用粉末X射线衍射(PXRD)验证了单相掺杂和未掺杂SbTe的合成以及Sm和In在SbTe晶格中的掺杂情况。此外,通过扫描电子显微镜(SEM)、拉曼分析和热重分析(TGA)系统地研究了其形貌、结构解析和稳定性。这些分析证实了六方未掺杂SbTe(AT)和(Sm,In)掺杂SbTe(SAT,IAT)微结构的成功合成。此外,还详细比较了AT、SAT和IAT的介电常数、介电损耗和损耗角正切等介电参数。由于三价(Sm,In)掺杂剂的掺杂,观察到交流电导率和直流电导率从1.92×10增加到4.9×10Ω·m,热导率降低(0.68 - 0.60 W·m·K)。据我们所知,此前尚未报道过(Sm,In)掺杂和未掺杂SbTe的合成及其介电性能与其电学性能和热导率的比较。这意味着在SbTe中适当掺杂(Sm,In)有望增强其电子和热电性能。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/59db/10034840/334edd21f645/ao2c05859_0002.jpg

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