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铋刺激自底向上金特征填充的机制。

Mechanism of Bismuth Stimulated Bottom-up Gold Feature Filling.

作者信息

Josell D, Braun T M, Moffat T P

机构信息

Materials Science and Engineering Division, National Institute of Standards and Technology, Gaithersburg, MD, USA.

出版信息

J Electrochem Soc. 2022;169(12). doi: 10.1149/1945-7111/acaccc.

Abstract

The mechanism underlying -stimulated bottom-up Au filling and self-passivation in trenches and vias in slightly alkaline ( ) + electrolytes is explored. The impacts of electrolyte components ( ), and and potential-dependent kinetic factors on the rate of Au electrodeposition are quantified experimentally. Derived parameters are applied within the surfactant conservation Curvature Enhanced Accelerator Coverage model to simulate the filling of high aspect ratio trenches. It is observed that Bi adsorption accelerates the Au deposition rate with a non-linear dependence occurring around a critical coverage. Further, the impact of electrolyte composition is such that gradients of and derived from reduction of during deposition accentuate deposition farther from the feature opening. These factors and surface area reduction at the bottoms of filling features localize active deposition to feature bottoms. Ultimately, weakening of the concentration gradients and associated kinetics as bottom-up feature filling progresses reduces the Bi coverage on the growth front below the critical value and bottom-up growth terminates. Good agreement is observed with key experimental features including the incubation period of conformal deposition, transition to bottom-up growth, subsequent bottom-up filling and finally self-passivation as the growth front nears the field.

摘要

探索了在弱碱性( )+ 电解质中, -刺激的自下而上的金填充以及沟槽和通孔中的自钝化机制。通过实验量化了电解质成分( )、 和 以及电势相关动力学因素对金电沉积速率的影响。将推导得到的参数应用于表面活性剂守恒曲率增强加速器覆盖模型中,以模拟高深宽比沟槽的填充过程。观察到铋吸附会加速金的沉积速率,在临界覆盖率附近出现非线性依赖关系。此外,电解质成分的影响使得在沉积过程中 还原产生的 和 的梯度在远离特征开口处加剧沉积。这些因素以及填充特征底部的表面积减小将活性沉积定位到特征底部。最终,随着自下而上的特征填充过程的进行,浓度梯度和相关动力学的减弱使得生长前沿的铋覆盖率降低到临界值以下,自下而上的生长终止。观察到与关键实验特征具有良好的一致性,包括共形沉积的潜伏期、向自下而上生长的转变、随后的自下而上填充以及最后当生长前沿接近场区时的自钝化。

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