Boehm Alex, Fonseca Jose J, Thürmer Konrad, Sugar Joshua D, Spataru Catalin D, Robinson Jeremy T, Ohta Taisuke
Sandia National Laboratories, Albuquerque, New Mexico 87185, United States.
Jacobs Technology Contractor at the U.S. Naval Research Laboratory, Washington, D.C. 20375, United States.
Nano Lett. 2023 Apr 12;23(7):2792-2799. doi: 10.1021/acs.nanolett.3c00080. Epub 2023 Apr 3.
Engineering the transition metal dichalcogenide (TMD)-metal interface is critical for the development of two-dimensional semiconductor devices. By directly probing the electronic structures of WS-Au and WSe-Au interfaces with high spatial resolution, we delineate nanoscale heterogeneities in the composite systems that give rise to local Schottky barrier height modulations. Photoelectron spectroscopy reveals large variations (>100 meV) in TMD work function and binding energies for the occupied electronic states. Characterization of the composite systems with electron backscatter diffraction and scanning tunneling microscopy leads us to attribute these heterogeneities to differing crystallite orientations in the Au contact, suggesting an inherent role of the metal microstructure in contact formation. We then leverage our understanding to develop straightforward Au processing techniques to form TMD-Au interfaces with reduced heterogeneity. Our findings illustrate the sensitivity of TMDs' electronic properties to metal contact microstructure and the viability of tuning the interface through contact engineering.
设计过渡金属二硫属化物(TMD)-金属界面对于二维半导体器件的发展至关重要。通过以高空间分辨率直接探测WS-Au和WSe-Au界面的电子结构,我们描绘了复合系统中的纳米级不均匀性,这些不均匀性导致了局部肖特基势垒高度调制。光电子能谱揭示了TMD功函数和占据电子态结合能的巨大变化(>100 meV)。用电子背散射衍射和扫描隧道显微镜对复合系统进行表征,使我们将这些不均匀性归因于Au接触中不同的微晶取向,这表明金属微观结构在接触形成中具有内在作用。然后,我们利用所获得的认识开发了直接的Au处理技术,以形成具有降低不均匀性的TMD-Au界面。我们的研究结果说明了TMD电子特性对金属接触微观结构的敏感性以及通过接触工程调整界面的可行性。