Sjökvist Robin, Tornberg Marcus, Marnauza Mikelis, Jacobsson Daniel, Dick Kimberly A
Centre for Analysis and Synthesis, Lund University, Box 124, 22100 Lund, Sweden.
NanoLund, Lund University, Box 118, 22100 Lund, Sweden.
ACS Nanosci Au. 2022 Aug 30;2(6):539-548. doi: 10.1021/acsnanoscienceau.2c00028. eCollection 2022 Dec 21.
Au-seeded semiconductor nanowires have classically been considered to only grow in a layer-by-layer growth mode, where individual layers nucleate and grow one at a time with an incubation step in between. Recent investigations have shown that there are circumstances where binary semiconductor nanowires grow in a multilayer fashion, creating a stack of incomplete layers at the interface between a nanoparticle and a nanowire. In the current investigation, the growth behavior in ternary InGaAs nanowires has been analyzed , using environmental transmission electron microscopy. The investigation has revealed that multilayer growth also occurs for ternary nanowires and appears to be more common than in the binary case. In addition, the size of the multilayer stacks observed is much larger than what has been reported previously. The investigation details the implications of multilayers for the overall growth of the nanowires, as well as the surrounding conditions under which it has manifested. We show that multilayer growth is highly dynamic, where the stack of layers regularly changes size by transporting material between the growing layers. Another observation is that multilayer growth can be initiated in conjunction with the formation of crystallographic defects and compositional changes. In addition, the role that multilayers can have in behaviors such as growth failure and kinking, sometimes observed when creating heterostructures between GaAs and InAs , is discussed. The prevalence of multilayer growth in this ternary material system implies that, in order to fully understand and accurately predict the growth of nanowires of complex composition and structure, multilayer growth has to be considered.
传统上认为金种子半导体纳米线仅以逐层生长模式生长,即各层依次成核并生长,层与层之间有一个孕育步骤。最近的研究表明,在某些情况下,二元半导体纳米线会以多层方式生长,在纳米颗粒与纳米线的界面处形成一堆不完整的层。在当前的研究中,利用环境透射电子显微镜分析了三元铟镓砷纳米线的生长行为。研究发现,三元纳米线也会出现多层生长,而且似乎比二元纳米线的情况更为常见。此外,观察到的多层堆叠的尺寸比之前报道的要大得多。该研究详细阐述了多层结构对纳米线整体生长的影响,以及其出现时的周围条件。我们表明,多层生长具有高度动态性,其中层堆叠通过在生长层之间传输材料而定期改变大小。另一个观察结果是,多层生长可以与晶体缺陷的形成和成分变化同时发生。此外,还讨论了多层结构在诸如生长失败和扭结等行为中可能起到的作用,这些行为在砷化镓和砷化铟之间形成异质结构时有时会观察到。这种三元材料系统中多层生长的普遍性意味着,为了全面理解并准确预测复杂成分和结构的纳米线的生长,必须考虑多层生长。