Padulles-Gaspar Esteban, Padulles-Roig Esteban, Cabanes Guillermo, Pérez Román A, Gil Javier, Bosch Begoña M
Facultad de Odontología, Universitat Internacional de Catalunya, C/Josep Trueta s/n, 08195 Barcelona, Spain.
Department of Implantology, University of La Salle, Madrid, EDE, C7Gaminedes 11, 28023 Madrid, Spain.
Materials (Basel). 2023 Apr 7;16(8):2953. doi: 10.3390/ma16082953.
One of the main problems in oral implantology today is peri-implantitis, which affects almost 20% of dental implants placed in patients. One of the most commonly used techniques to eliminate bacterial biofilm is the implantoplasty, that consists of the mechanical modification of the implant surface topography followed by treatments with chemical reagents for decontamination. In this study, the main aim is to evaluate the use of two different chemical treatments based on hypochlorous acid (HClO) and hydrogen peroxide (HO). For this purpose, 75 titanium grade 3 discs were treated with implantoplasty according to established protocols. Twenty-five discs were used as controls, 25 were treated with concentrated HClO and 25 were treated with concentrated HClO followed by treatment with 6% HO. The roughness of the discs was determined using the interferometric process. Cytotoxicity with SaOs-2 osteoblastic cells was quantified at 24 and 72 h, whereas bacteria proliferation using and bacteria was quantified at 5 s and 1 min of treatment. The results showed an increase in the roughness values, the control discs had an Ra of 0.33 μm and those treated with HClO and HO reached 0.68 μm. Cytotoxicity was present at 72 h, together with a significant proliferation of bacteria. These biological and microbiological results can be attributed to the roughness produced by the chemical agents that triggered bacterial adsorption while inhibiting osteoblast adhesion. The results indicate that even if this treatment can decontaminate the titanium surface after implantation, the produced topography will generate an environment that will not favor long-term performance.
如今口腔种植学的主要问题之一是种植体周围炎，它影响了近20%植入患者体内的牙种植体。消除细菌生物膜最常用的技术之一是种植体表面成形术，它包括对种植体表面形貌进行机械修饰，然后用化学试剂进行去污处理。在本研究中，主要目的是评估基于次氯酸（HClO）和过氧化氢（HO）的两种不同化学处理方法的使用情况。为此，根据既定方案对75个3级钛盘进行了种植体表面成形术处理。25个圆盘用作对照，25个用浓HClO处理，25个先用浓HClO处理，然后用6%的HO处理。使用干涉测量法测定圆盘的粗糙度。在24小时和72小时时对SaOs-2成骨细胞的细胞毒性进行定量，而在处理5秒和1分钟时对使用 和 细菌的细菌增殖进行定量。结果显示粗糙度值增加，对照圆盘的Ra为0.33μm，而用HClO和HO处理的圆盘达到0.68μm。在72小时时存在细胞毒性，同时细菌大量增殖。这些生物学和微生物学结果可归因于化学试剂产生的粗糙度，这种粗糙度引发了细菌吸附，同时抑制了成骨细胞的粘附。结果表明，即使这种处理可以在植入后对钛表面进行去污，但所产生的形貌将产生一个不利于长期性能的环境。
