Milenko Karolina, Dullo Firehun Tsige, Thrane Paul C V, Skokic Zeljko, Dirdal Christopher A
SINTEF Microsystems and Nanotechnology, Gaustadalleen 23C, 0737 Oslo, Norway.
Nanomaterials (Basel). 2023 May 10;13(10):1598. doi: 10.3390/nano13101598.
A controlled and reliable nanostructured metallic substrate is a prerequisite for developing effective surface-enhanced Raman scattering (SERS) spectroscopy techniques. In this study, we present a novel SERS platform fabricated using ultra-violet nanoimprint lithography (UV-NIL) to produce large-area, ordered nanostructured arrays. By using UV-NIL imprinted patterns in resist, we were able to overcome the main limitations present in most common SERS platforms, such as nonuniformity, nonreproducibility, low throughput, and high cost. We simulated and fabricated C-shaped plasmonic nanostructures that exhibit high signal enhancement at an excitation wavelength of 785 nm. The substrates were fabricated by directly coating the imprinted resist with a thin gold layer. Avoiding the need to etch patterns in silicon significantly reduces the time and cost of fabrication and facilitates reproducibility. The functionality of the substrates for SERS detection was validated by measuring the SERS spectra of Rhodamine 6G.
可控且可靠的纳米结构金属基底是开发有效的表面增强拉曼散射（SERS）光谱技术的前提条件。在本研究中，我们展示了一种使用紫外纳米压印光刻技术（UV-NIL）制造的新型SERS平台，用于生产大面积、有序的纳米结构阵列。通过在抗蚀剂中使用UV-NIL压印图案，我们能够克服大多数常见SERS平台中存在的主要限制，如不均匀性、不可重复性、低通量和高成本。我们模拟并制造了在785nm激发波长下表现出高信号增强的C形等离子体纳米结构。通过直接在压印抗蚀剂上涂覆薄金层来制造基底。避免在硅中蚀刻图案显著减少了制造时间和成本，并有助于实现可重复性。通过测量罗丹明6G的SERS光谱验证了基底用于SERS检测的功能。
