Ko Taewoo, Kumar Samir, Shin Sanghoon, Seo Dongmin, Seo Sungkyu
Department of Electronics and Information Engineering, Korea University, Sejong 30019, Republic of Korea.
Department of Electrical Engineering, Semyung University, Jecheon 27136, Republic of Korea.
Nanomaterials (Basel). 2023 Jul 20;13(14):2111. doi: 10.3390/nano13142111.
Micro/nano patterns based on quantum dots (QDs) are of great interest for applications ranging from electronics to photonics to sensing devices for biomedical purposes. Several patterning methods have been developed, but all lack the precision and reproducibility required to fabricate precise, complex patterns of less than one micrometer in size, or require specialized crosslinking ligands, limiting their application. In this study, we present a novel approach to directly pattern QD nanopatterns by electron beam lithography using commercially available colloidal QDs without additional modifications. We have successfully generated reliable dot and line QD patterns with dimensions as small as 140 nm. In addition, we have shown that using a 10 nm SiO spacer layer on a 50 nm Au layer substrate can double the fluorescence intensity compared to QDs on the Au layer without SiO. This method takes advantage of traditional nanolithography without the need for a resist layer.
基于量子点（QD）的微纳图案在从电子学到光子学再到生物医学用途的传感设备等广泛应用中备受关注。已经开发了几种图案化方法，但所有这些方法都缺乏制造尺寸小于一微米的精确、复杂图案所需的精度和可重复性，或者需要专门的交联配体，从而限制了它们的应用。在本研究中，我们提出了一种新颖的方法，通过电子束光刻直接对量子点纳米图案进行图案化，使用市售的胶体量子点，无需额外修饰。我们已经成功生成了尺寸小至140纳米的可靠的点和线量子点图案。此外，我们已经表明，在50纳米金层基板上使用10纳米二氧化硅间隔层，与没有二氧化硅的金层上的量子点相比，荧光强度可以加倍。这种方法利用了传统的纳米光刻技术，无需抗蚀剂层。
