Hong Hyo Chan, Ryu Jeong In, Lee Hyo Chan
Department of Chemical Engineering, Myongji University, Yongin 17058, Republic of Korea.
Nanomaterials (Basel). 2023 Jul 30;13(15):2217. doi: 10.3390/nano13152217.
Multilayer graphene has attracted significant attention because its physical properties can be tuned by stacking its layers in a particular configuration. To apply the intriguing properties of multilayer graphene in various optoelectronic or spintronic devices, it is essential to develop a synthetic method that enables the control of the stacking configuration. This review article presents the recent progress in the synthesis of multilayer graphene by chemical vapor deposition (CVD). First, we discuss the CVD of multilayer graphene, utilizing the precipitation or segregation of carbon atoms from metal catalysts with high carbon solubility. Subsequently, we present novel CVD approaches to yield uniform and thickness-controlled multilayer graphene, which goes beyond the conventional precipitation or segregation methods. Finally, we introduce the latest studies on the control of stacking configurations in bilayer graphene during CVD processes.
多层石墨烯因其物理性质可通过将各层堆叠成特定构型来调节而备受关注。为了在各种光电器件或自旋电子器件中应用多层石墨烯的有趣特性，开发一种能够控制堆叠构型的合成方法至关重要。这篇综述文章介绍了通过化学气相沉积（CVD）合成多层石墨烯的最新进展。首先，我们讨论利用来自具有高碳溶解度的金属催化剂的碳原子沉淀或偏析来进行多层石墨烯的CVD。随后，我们介绍了新颖的CVD方法，以制备均匀且厚度可控的多层石墨烯，这超越了传统的沉淀或偏析方法。最后，我们介绍了关于在CVD过程中控制双层石墨烯堆叠构型的最新研究。
