Liu Bingyan, Liu Shirong, Devaraj Vasanthan, Yin Yuxiang, Zhang Yueqi, Ai Jingui, Han Yaochen, Feng Jicheng
School of Physical Science and Technology, ShanghaiTech University, Shanghai, China.
Bio-IT Fusion Technology Research Institute, Pusan National University, Busan, Republic of Korea.
Nat Commun. 2023 Aug 15;14(1):4920. doi: 10.1038/s41467-023-40577-3.
Metallized arrays of three-dimensional (3D) nanoarchitectures offer new and exciting prospects in nanophotonics and nanoelectronics. Engineering these repeating nanoarchitectures, which have dimensions smaller than the wavelength of the light source, enables in-depth investigation of unprecedented light-matter interactions. Conventional metal nanomanufacturing relies largely on lithographic methods that are limited regarding the choice of materials and machine write time and are restricted to flat patterns and rigid structures. Herein, we present a 3D nanoprinter devised to fabricate flexible arrays of 3D metallic nanoarchitectures over areas up to 4 × 4 mm within 20 min. By suitably adjusting the electric and flow fields, metal lines as narrow as 14 nm were printed. We also demonstrate the key ability to print a wide variety of materials ranging from single metals, alloys to multimaterials. In addition, the optical properties of the as-printed 3D nanoarchitectures can be tailored by varying the material, geometry, feature size, and periodic arrangement. The custom-designed and custom-built 3D nanoprinter not only combines metal 3D printing with nanoscale precision but also decouples the materials from the printing process, thereby yielding opportunities to advance future nanophotonics and semiconductor devices.
三维（3D）纳米结构的金属化阵列在纳米光子学和纳米电子学领域展现出了全新且令人兴奋的前景。对这些尺寸小于光源波长的重复性纳米结构进行工程设计，能够深入研究前所未有的光与物质相互作用。传统的金属纳米制造主要依赖光刻方法，这种方法在材料选择和机器写入时间方面存在局限性，并且仅限于平面图案和刚性结构。在此，我们展示了一种3D纳米打印机，它能够在20分钟内在面积达4×4毫米的区域上制造出3D金属纳米结构的柔性阵列。通过适当调整电场和流场，打印出了窄至14纳米的金属线。我们还展示了打印多种材料的关键能力，这些材料包括单一金属、合金以及多材料。此外，通过改变材料、几何形状、特征尺寸和周期性排列，可以定制所打印的3D纳米结构的光学特性。这种定制设计和定制构建的3D纳米打印机不仅将金属3D打印与纳米级精度相结合，还使材料与打印过程解耦，从而为推动未来纳米光子学和半导体器件的发展创造了机会。
