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用于预测具有掺杂在聚乙烯吡咯烷酮界面层中的石墨烯和钛酸锌纳米结构的肖特基结构电学特性的机器学习方法。

Machine learning approach for predicting electrical features of Schottky structures with graphene and ZnTiO nanostructures doped in PVP interfacial layer.

作者信息

Barkhordari Ali, Mashayekhi Hamid Reza, Amiri Pari, Özçelik Süleyman, Altındal Şemsettin, Azizian-Kalandaragh Yashar

机构信息

Faculty of Physics, Shahid Bahonar University of Kerman, Kerman, Iran.

Department of Engineering Sciences, University of Mohaghegh Ardabili, Namin, Iran.

出版信息

Sci Rep. 2023 Aug 22;13(1):13685. doi: 10.1038/s41598-023-41000-z.

DOI:10.1038/s41598-023-41000-z
PMID:37607982
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC10444853/
Abstract

In this research, for some different Schottky type structures with and without a nanocomposite interfacial layer, the current-voltage (I-V) characteristics have been investigated by using different Machine Learning (ML) algorithms to predict and analyze the structures' principal electric parameters such as leakage current (I), barrier height ([Formula: see text]), ideality factor (n), series resistance (R), shunt resistance (R), rectifying ratio (RR), and interface states density (N). The interfacial nanocomposite layer is made by composing polyvinyl-pyrrolidone (PVP), zinc titanate (ZnTiO), and graphene (Gr) nanostructures. The Gaussian Process Regression (GPR), Kernel Ridge Regression (KRR), Support Vector Regression (SVR), and Artificial Neural Network (ANN) are used as ML algorithms. The ML techniques training data are obtained using the thermionic emission method. Finally, by comparing the experimental and predicted results, the performance of the different ML algorithms in predicting the electrical parameters of Schottky diodes (SDs) has been compared to find the optimized ML algorithm. The ML predictions of basic electrical parameters by almost all algorithms are in good agreement with the actual values, while the SVR model has predicted closer values to the corresponding actual ones. The obtained results show that the quantity of the leakage current and N for MS type SD decreases, and φ increases with the interfacial layer usage, especially with graphene dopant.

摘要

在本研究中,针对一些具有和不具有纳米复合界面层的不同肖特基型结构,通过使用不同的机器学习(ML)算法来预测和分析结构的主要电学参数,如漏电流(I)、势垒高度([公式:见正文])、理想因子(n)、串联电阻(R)、并联电阻(R)、整流比(RR)和界面态密度(N),研究了其电流 - 电压(I - V)特性。界面纳米复合层由聚乙烯吡咯烷酮(PVP)、钛酸锌(ZnTiO)和石墨烯(Gr)纳米结构组成。高斯过程回归(GPR)、核岭回归(KRR)、支持向量回归(SVR)和人工神经网络(ANN)被用作ML算法。ML技术的训练数据通过热电子发射方法获得。最后,通过比较实验结果和预测结果,比较了不同ML算法在预测肖特基二极管(SDs)电学参数方面的性能,以找到优化的ML算法。几乎所有算法对基本电学参数的ML预测与实际值都有很好的一致性,而SVR模型预测的值与相应的实际值更接近。所得结果表明,对于MS型SD,使用界面层,特别是使用石墨烯掺杂剂时,漏电流和N的量会减少,而φ会增加。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/4c79/10444853/af42ff1225a7/41598_2023_41000_Fig8_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/4c79/10444853/b1c5d11dba4a/41598_2023_41000_Fig1_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/4c79/10444853/9da26e0e071b/41598_2023_41000_Fig2_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/4c79/10444853/05daa63a0155/41598_2023_41000_Fig3_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/4c79/10444853/f7f706e13cc3/41598_2023_41000_Fig4_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/4c79/10444853/9cc98244b48f/41598_2023_41000_Fig5_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/4c79/10444853/569f309088c7/41598_2023_41000_Fig6_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/4c79/10444853/ce53679a81cb/41598_2023_41000_Fig7_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/4c79/10444853/af42ff1225a7/41598_2023_41000_Fig8_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/4c79/10444853/b1c5d11dba4a/41598_2023_41000_Fig1_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/4c79/10444853/9da26e0e071b/41598_2023_41000_Fig2_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/4c79/10444853/05daa63a0155/41598_2023_41000_Fig3_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/4c79/10444853/f7f706e13cc3/41598_2023_41000_Fig4_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/4c79/10444853/9cc98244b48f/41598_2023_41000_Fig5_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/4c79/10444853/569f309088c7/41598_2023_41000_Fig6_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/4c79/10444853/ce53679a81cb/41598_2023_41000_Fig7_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/4c79/10444853/af42ff1225a7/41598_2023_41000_Fig8_HTML.jpg

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