Zhang Zihao, Zhang Baoqing, Wang Yiming, Wang Mingyang, Zhang Yifei, Li Hu, Zhang Jiawei, Song Aimin
Shandong Technology Center of Nanodevices and Integration, School of Microelectronics, Shandong University, Jinan 250100, China.
Suzhou Research Institute, Shandong University, Suzhou 215123, China.
Nano Lett. 2023 Sep 13;23(17):8132-8139. doi: 10.1021/acs.nanolett.3c02281. Epub 2023 Sep 5.
The resonant tunneling diode (RTD) is one of the very few room-temperature-operating quantum devices to date that is able to exhibit negative differential resistance. However, the reported key figure of merit, the current peak-to-valley ratio (PVR), of graphene RTDs has been up to only 3.9 at room temperature thus far. This remains very puzzling, given the atomically flat interfaces of the 2D materials. By varying the active area and perimeter of RTDs based on a graphene/hexagonal boron nitride/graphene heterostructure, we discovered that the edge doping can play a dominant role in determining the resonant tunneling, and a large area-to-perimeter ratio is necessary to obtain a high PVR. The understanding enables establishing a novel design rule and results in a PVR of 14.9, which is at least a factor of 3.8 higher than previously reported graphene RTDs. Furthermore, a theory is developed allowing extraction of the edge doping depth for the first time.
共振隧穿二极管(RTD)是迄今为止极少数能够在室温下工作并表现出负微分电阻的量子器件之一。然而,迄今为止,所报道的石墨烯RTD的关键性能指标,即电流峰谷比(PVR),在室温下仅达到3.9。考虑到二维材料具有原子级平整的界面,这仍然非常令人费解。通过改变基于石墨烯/六方氮化硼/石墨烯异质结构的RTD的有源面积和周长,我们发现边缘掺杂在决定共振隧穿方面可以发挥主导作用,并且需要大面积周长比才能获得高PVR。这一认识使得能够建立一种新颖的设计规则,并得到了14.9的PVR,这比之前报道的石墨烯RTD至少高出3.8倍。此外,还开发了一种理论,首次允许提取边缘掺杂深度。