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调控表面氢化学吸附作用下的MoSiN单层的电子结构与光学性质

Engineering electronic structures and optical properties of a MoSiN monolayer modulating surface hydrogen chemisorption.

作者信息

Zhang Yumei, Dong Shunhong, Murugan Pachaiyappan, Zhu Ting, Qing Chen, Liu Zhiyong, Zhang Weibin, Wang Hong-En

机构信息

Yunnan Key Laboratory of Optoelectronic Information Technology, College of Physics and Electronic Information, Yunnan Normal University Kunming 650500 China

Key Laboratory of Advanced Technique & Preparation for Renewable Energy Materials, Ministry of Education, Yunnan Normal University China.

出版信息

RSC Adv. 2023 Sep 4;13(38):26475-26483. doi: 10.1039/d3ra04428a.

Abstract

Recently, a MoSiN monolayer has been successfully synthesized by a delicately designed chemical vapor deposition (CVD) method. It exhibits promising (opto)electronic properties due to a relatively narrow bandgap (∼1.94 eV), high electron/hole mobility, and excellent thermal/chemical stability. Currently, much effort is being devoted to further improving its properties through engineering defects or constructing nanocomposites (, van der Waals heterostructures). Herein, we report a theoretical investigation on hydrogenation as an alternative surface functionalization approach to effectively manipulate its electronic structures and optical properties. The calculation results suggested that chemisorption of H atoms on the top of N atoms on MoSiN was energetically most favored. Upon H chemisorption, the band gap values gradually decreased from 1.89 eV (for intrinsic MoSiN) to 0 eV (for MoSiN-16H) and 0.25 eV (for MoSiN-32H), respectively. The results of optical properties studies revealed that a noticeable enhancement in light absorption intensity could be realized in the visible light range after the surface hydrogenation process. Specifically, full-hydrogenated MoSiN (MoSiN-32H) manifested a higher absorption coefficient than that of semi-hydrogenated MoSiN (MoSiN-16H) in the visible light range. This work can provide theoretical guidance for rational engineering of optical and optoelectronic properties of MoSiN monolayer materials surface hydrogenation towards emerging applications in electronics, optoelectronics, photocatalysis,

摘要

最近,通过精心设计的化学气相沉积(CVD)方法成功合成了一种MoSiN单层。由于其相对较窄的带隙(约1.94 eV)、高电子/空穴迁移率以及优异的热/化学稳定性,它展现出了有前景的(光)电子特性。目前,人们正致力于通过调控缺陷或构建纳米复合材料(如范德华异质结构)来进一步改善其性能。在此,我们报告了一项关于氢化作为一种替代表面功能化方法以有效调控其电子结构和光学性质的理论研究。计算结果表明,H原子化学吸附在MoSiN的N原子顶部在能量上是最有利的。在H化学吸附后,带隙值分别从1.89 eV(对于本征MoSiN)逐渐降低到0 eV(对于MoSiN - 16H)和0.25 eV(对于MoSiN - 32H)。光学性质研究结果表明,表面氢化处理后在可见光范围内可以实现光吸收强度的显著增强。具体而言,全氢化的MoSiN(MoSiN - 32H)在可见光范围内表现出比半氢化的MoSiN(MoSiN - 16H)更高的吸收系数。这项工作可为MoSiN单层材料的光学和光电子性质的合理调控提供理论指导,通过表面氢化实现其在电子学、光电子学、光催化等新兴应用中的应用。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/696e/10476555/a29787446e31/d3ra04428a-f1.jpg

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