Luo Peng, Zhao Yihui
School of Optics and Photonics, Beijing Institute of Technology, Beijing 100081, China.
Key Laboratory of Photoelectronic Imaging Technology and System, Ministry of Education of the People's Republic of China, Beijing 100081, China.
Molecules. 2023 Aug 23;28(17):6200. doi: 10.3390/molecules28176200.
Niobium nitride (NbN) is widely used in the production of superconducting nanowire single-photon detectors (SNSPDs) due to its high superconducting transition temperature and suitable energy gap. The processing parameters used for the preparation of NbN films and the subsequent processing of nanowires have a significant effect on the performance of the SNSPD. In this review, we will present various thin film growth methods, including magnetron sputtering, atomic layer deposition (ALD), and chemical vapor deposition (CVD). The relationships between the superconducting performance of each thin film and the corresponding deposition process will be discussed. Subsequently, NbN nanowire fabrication methods and microstructures based on thin film etching will be summarized, and their impact on the qualities of the finished SNSPDs will be systematically analyzed. Finally, we will provide an outlook for the future development of preparation for SNSPD.
氮化铌(NbN)因其高超导转变温度和合适的能隙而被广泛应用于超导纳米线单光子探测器(SNSPD)的生产。用于制备NbN薄膜的工艺参数以及随后的纳米线加工对SNSPD的性能有重大影响。在这篇综述中,我们将介绍各种薄膜生长方法,包括磁控溅射、原子层沉积(ALD)和化学气相沉积(CVD)。将讨论每种薄膜的超导性能与相应沉积工艺之间的关系。随后,将总结基于薄膜蚀刻的NbN纳米线制造方法和微观结构,并系统分析它们对成品SNSPD质量的影响。最后,我们将对SNSPD制备的未来发展进行展望。