Li Saijun, Shen Meng-Chun, Lai Shouqiang, Dai Yurong, Chen Jinlan, Zheng Lijie, Zhu Lihong, Chen Guolong, Lin Su-Hui, Peng Kang-Wei, Chen Zhong, Wu Tingzhu
Opt Express. 2023 Oct 23;31(22):36547-36556. doi: 10.1364/OE.503964.
The effects of different p-GaN layer thickness on the photoelectric and thermal properties of AlGaN-based deep-ultraviolet light-emitting diodes (DUV-LEDs) were investigated. The results revealed that appropriate thinning of the p-GaN layer enhances the photoelectric performance and thermal stability of DUV-LEDs, reducing current crowding effects that affect the external quantum efficiency and chip heat dissipation. The ABC + f(n) model was used to analyse the EQE, which helped in identifying the different physical mechanisms for DUV-LEDs with different p-GaN layer thickness. Moreover, the finite difference time domain simulation results revealed that the light-extraction efficiency of the DUV-LEDs exhibits a trend similar to that of damped vibration as the thickness of the p-GaN layer increases. The AlGaN-based DUV-LED with a p-GaN layer thickness of 20 nm exhibited the best photoelectric characteristics and thermal stability.
研究了不同厚度的p-GaN层对基于AlGaN的深紫外发光二极管(DUV-LED)光电和热性能的影响。结果表明,适当减薄p-GaN层可提高DUV-LED的光电性能和热稳定性,减少影响外部量子效率和芯片散热的电流拥挤效应。采用ABC + f(n)模型分析外量子效率(EQE),有助于识别具有不同p-GaN层厚度的DUV-LED的不同物理机制。此外,时域有限差分模拟结果表明,随着p-GaN层厚度的增加,DUV-LED的光提取效率呈现出类似于阻尼振动的趋势。p-GaN层厚度为20 nm的基于AlGaN的DUV-LED表现出最佳的光电特性和热稳定性。