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p型氮化镓层厚度对基于氮化铝镓的深紫外发光二极管光电和热性能的影响

Impacts of p-GaN layer thickness on the photoelectric and thermal performance of AlGaN-based deep-UV LEDs.

作者信息

Li Saijun, Shen Meng-Chun, Lai Shouqiang, Dai Yurong, Chen Jinlan, Zheng Lijie, Zhu Lihong, Chen Guolong, Lin Su-Hui, Peng Kang-Wei, Chen Zhong, Wu Tingzhu

出版信息

Opt Express. 2023 Oct 23;31(22):36547-36556. doi: 10.1364/OE.503964.

Abstract

The effects of different p-GaN layer thickness on the photoelectric and thermal properties of AlGaN-based deep-ultraviolet light-emitting diodes (DUV-LEDs) were investigated. The results revealed that appropriate thinning of the p-GaN layer enhances the photoelectric performance and thermal stability of DUV-LEDs, reducing current crowding effects that affect the external quantum efficiency and chip heat dissipation. The ABC + f(n) model was used to analyse the EQE, which helped in identifying the different physical mechanisms for DUV-LEDs with different p-GaN layer thickness. Moreover, the finite difference time domain simulation results revealed that the light-extraction efficiency of the DUV-LEDs exhibits a trend similar to that of damped vibration as the thickness of the p-GaN layer increases. The AlGaN-based DUV-LED with a p-GaN layer thickness of 20 nm exhibited the best photoelectric characteristics and thermal stability.

摘要

研究了不同厚度的p-GaN层对基于AlGaN的深紫外发光二极管(DUV-LED)光电和热性能的影响。结果表明,适当减薄p-GaN层可提高DUV-LED的光电性能和热稳定性,减少影响外部量子效率和芯片散热的电流拥挤效应。采用ABC + f(n)模型分析外量子效率(EQE),有助于识别具有不同p-GaN层厚度的DUV-LED的不同物理机制。此外,时域有限差分模拟结果表明,随着p-GaN层厚度的增加,DUV-LED的光提取效率呈现出类似于阻尼振动的趋势。p-GaN层厚度为20 nm的基于AlGaN的DUV-LED表现出最佳的光电特性和热稳定性。

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