Ren Xiaoyu, Yao Selina X, Zhu Jiacheng, Deng Zejun, Wang Yijia, Zhang Baoshun, Zeng Zhongming, Zhai Hao
Key Lab of Nanodevices and Applications, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Sciences, Suzhou 215123, China.
Department of Mechanical Engineering, University of Vermont, Burlington, VT 05405, USA.
Micromachines (Basel). 2023 Nov 30;14(12):2198. doi: 10.3390/mi14122198.
The increasing demand for accurate imaging spectral information in remote sensing detection has driven the development of hyperspectral remote sensing instruments towards a larger view field and higher resolution. As the core component of the spectrometer slit, the designed length reaches tens of millimeters while the precision maintained within the μm level. Such precision requirements pose challenges to traditional machining and laser processing. In this paper, a high-precision air slit was created with a large aspect ratio through MEMS technology on SOI silicon wafers. In particular, a MEMS slit was prepared with a width of 15 μm and an aspect ratio exceeding 4000:1, and a spectral spectroscopy system was created and tested with a Hg-Cd light source. As a result, the spectral spectrum was linear within the visible range, and a spectral resolution of less than 1 nm was obtained. The standard deviation of resolution is only one-fourth of that is seen in machined slits across various view fields. This research provided a reliable and novel manufacturing technique for high-precision air slits, offering technical assistance in developing high-resolution wide-coverage imaging spectrometers.
遥感探测中对精确成像光谱信息的需求不断增加，推动了高光谱遥感仪器朝着更大视场和更高分辨率的方向发展。作为光谱仪狭缝的核心部件，其设计长度达到数十毫米，而精度保持在微米级别。如此高的精度要求给传统加工和激光加工带来了挑战。本文通过MEMS技术在SOI硅片上制作了具有大长宽比的高精度空气狭缝。具体而言，制备了宽度为15μm、长宽比超过4000:1的MEMS狭缝，并使用汞镉光源创建并测试了光谱系统。结果表明，光谱在可见光范围内呈线性，获得了小于1nm的光谱分辨率。分辨率的标准偏差仅为不同视场下加工狭缝的四分之一。该研究为高精度空气狭缝提供了一种可靠且新颖的制造技术，为开发高分辨率宽覆盖成像光谱仪提供了技术支持。
