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来自量子化氧化铟锡单层的大二阶磁化率。

Large second-order susceptibility from a quantized indium tin oxide monolayer.

作者信息

Zhang Yiyun, Gao Bingtao, Lepage Dominic, Tong Yuanbiao, Wang Pan, Xia Wendi, Niu Junru, Feng Yiming, Chen Hongsheng, Qian Haoliang

机构信息

Interdisciplinary Center for Quantum Information, State Key Laboratory of Extreme Photonics and Instrumentation, ZJU-Hangzhou Global Scientific and Technological Innovation Center, Zhejiang University, Hangzhou, China.

International Joint Innovation Center, Key Laboratory of Advanced Micro/Nano Electronic Devices and Smart Systems of Zhejiang, Electromagnetics Academy at Zhejiang University, Zhejiang University, Haining, China.

出版信息

Nat Nanotechnol. 2024 Apr;19(4):463-470. doi: 10.1038/s41565-023-01574-1. Epub 2024 Jan 2.

Abstract

Due to their high optical transparency and electrical conductivity, indium tin oxide thin films are a promising material for photonic circuit design and applications. However, their weak optical nonlinearity has been a substantial barrier to nonlinear signal processing applications. In this study, we show that an atomically thin (~1.5 nm) indium tin oxide film in the form of an air/indium tin oxide/SiO quantum well exhibits a second-order susceptibility χ of ~1,800 pm V. First-principles calculations and quantum electrostatic modelling point to an electronic interband transition resonance in the asymmetric potential energy of the quantum well as the reason for this large χ value. As the χ value is more than 20 times higher than that of the traditional nonlinear LiNbO crystal, our indium tin oxide quantum well design can be an important step towards nonlinear photonic circuit applications.

摘要

由于具有高光学透明度和导电性,氧化铟锡薄膜是光子电路设计与应用中一种很有前景的材料。然而,其较弱的光学非线性一直是阻碍非线性信号处理应用的重大障碍。在本研究中,我们表明,以空气/氧化铟锡/二氧化硅量子阱形式存在的原子级薄(约1.5纳米)氧化铟锡薄膜表现出约1800皮米/伏的二阶极化率χ。第一性原理计算和量子静电模型表明,量子阱不对称势能中的电子带间跃迁共振是导致该χ值较大的原因。由于该χ值比传统非线性铌酸锂晶体的χ值高出20倍以上,我们的氧化铟锡量子阱设计可能是迈向非线性光子电路应用的重要一步。

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