Han Kaizhen, Kang Yuye, Tu Yi-Hsin, Wu Chaoming, Wang Chengkuan, Liu Long, Zhang Gong, Chen Yue, Ni Kai, Liang Gengchiau, Gong Xiao
Department of Electrical and Computer Engineering, National University of Singapore (NUS), Singapore 117582.
Electrical Engineering Department, University of Notre Dame, Notre Dame, Indiana 46556 United States.
Nano Lett. 2024 Jul 3;24(26):7919-7926. doi: 10.1021/acs.nanolett.4c01172. Epub 2024 Jun 5.
Schottky diode, capable of ultrahigh frequency operation, plays a critical role in modern communication systems. To develop cost-effective and widely applicable high-speed diodes, researchers have delved into thin-film semiconductors. However, a performance gap persists between thin-film diodes and conventional bulk semiconductor-based ones. Featuring high mobility and low permittivity, indium-tin-oxide has emerged to bridge this gap. Nevertheless, due to its high carrier concentration, indium-tin-oxide has predominantly been utilized as electrode rather than semiconductor. In this study, a remarkable quantum confinement induced dedoping phenomenon was discovered during the aggressive indium-tin-oxide thickness downscaling. By leveraging such a feature to change indium-tin-oxide from metal-like into semiconductor-like, in conjunction with a novel heterogeneous lateral design facilitated by an innovative digital etch, we demonstrated an indium-tin-oxide Schottky diode with a cutoff frequency reaching terahertz band. By pushing the boundaries of thin-film Schottky diodes, our research offers a potential enabler for future fifth-generation/sixth-generation networks, empowering diverse applications.
肖特基二极管能够进行超高频操作,在现代通信系统中发挥着关键作用。为了开发具有成本效益且广泛适用的高速二极管,研究人员深入研究了薄膜半导体。然而,薄膜二极管与传统的基于体半导体的二极管之间仍然存在性能差距。具有高迁移率和低介电常数的氧化铟锡已出现以弥合这一差距。尽管如此,由于其高载流子浓度,氧化铟锡主要被用作电极而非半导体。在本研究中,在积极缩小氧化铟锡厚度的过程中发现了一种显著的量子限制诱导去掺杂现象。通过利用这一特性将氧化铟锡从类金属转变为类半导体,并结合由创新的数字蚀刻促成的新型异质横向设计,我们展示了一种截止频率达到太赫兹频段的氧化铟锡肖特基二极管。通过突破薄膜肖特基二极管的界限,我们的研究为未来的第五代/第六代网络提供了一种潜在的推动因素,助力各种应用。