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通过真空氩等离子体对哈斯塔莱克斯进行表面活化以增强细胞相容性。

Surface activation of Hastalex by vacuum argon plasma for cytocompatibility enhancement.

作者信息

Slepičková Kasálková Nikola, Rimpelová Silvie, Vacek Cyril, Fajstavr Dominik, Švorčík Václav, Sajdl Petr, Slepička Petr

机构信息

Department of Solid State Engineering, University of Chemistry and Technology Prague, 166 28 Prague, Czech Republic.

Department of Biochemistry and Microbiology, University of Chemistry and Technology Prague, 166 28 Prague, Czech Republic.

出版信息

Heliyon. 2024 Mar 11;10(6):e27816. doi: 10.1016/j.heliyon.2024.e27816. eCollection 2024 Mar 30.

Abstract

Here, we present surface analysis and biocompatibility evaluation of novel composite material based on graphene oxide traded as Hastalex. First, the surface morphology and elemental analysis of the pristine material were examined by atomic force and scanning electron microscopies, and by energy-dispersive and X-ray photoelectron spectroscopies, respectively. The Hastalex surface was then modified by plasma (3 and 8 W with exposure times up to 240 s), the impact of which on the material surface wettability and morphology was further evaluated. In addition, the material aging was studied at room and elevated temperatures. Significant changes in surface roughness, morphology, and area were detected at the nanometer scale after plasma exposure. An increase in oxygen content due to the plasma exposure was observed both for 3 and 8 W. The plasma treatment had an outstanding effect on the cytocompatibility of Hastalex foil treated at both input powers of 3 and 8 W. The cell number of human MRC-5 fibroblasts on Hastalex foils exposed to plasma increased significantly compared to pristine Hastalex and even to tissue culture polystyrene. The plasma exposure also affected the fibroblasts' cell growth and shape.

摘要

在此,我们展示了以Hastalex销售的基于氧化石墨烯的新型复合材料的表面分析和生物相容性评估。首先,分别通过原子力显微镜和扫描电子显微镜以及能量色散光谱和X射线光电子能谱对原始材料的表面形态和元素进行了分析。然后用等离子体(3瓦和8瓦,暴露时间长达240秒)对Hastalex表面进行改性,并进一步评估其对材料表面润湿性和形态的影响。此外,还研究了该材料在室温和高温下的老化情况。等离子体暴露后,在纳米尺度上检测到表面粗糙度、形态和面积有显著变化。对于3瓦和8瓦的情况,均观察到由于等离子体暴露导致氧含量增加。等离子体处理对在3瓦和8瓦两种输入功率下处理的Hastalex箔的细胞相容性有显著影响。与原始Hastalex甚至组织培养聚苯乙烯相比,暴露于等离子体的Hastalex箔上的人MRC - 5成纤维细胞数量显著增加。等离子体暴露还影响了成纤维细胞的细胞生长和形状。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/640f/10951612/f82caae63e5d/ga1.jpg

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