Tzadka Sivan, Ureña Martin Carlos, Toledo Esti, Yassin Abed Al Kader, Pandey Ashish, Le Saux Guillaume, Porgador Angel, Schvartzman Mark
Department of Materials Engineering, Ben-Gurion University of the Negev, P.O. Box 653, Beer-Sheva 84105, Israel.
Ilse Katz Institute for Nanoscale Science and Technology, Ben-Gurion University of the Negev, P.O. Box 653, Beer-Sheva 84105, Israel.
ACS Appl Mater Interfaces. 2024 Apr 10;16(14):17846-17856. doi: 10.1021/acsami.3c18554. Epub 2024 Mar 28.
We introduce a novel approach for colloidal lithography based on the dry particle assembly into a dense monolayer on an elastomer, followed by mechanical transfer to a substrate of any material and curvature. This method can be implemented either manually or automatically and it produces large area patterns with the quality obtained by the state-of-the-art colloidal lithography at a very high throughput. We first demonstrated the fabrication of nanopatterns with a periodicity ranging between 200 nm and 2 μm. We then demonstrated two nanotechnological applications of this approach. The first one is antireflective structures, fabricated on silicon and sapphire, with different geometries including arrays of bumps and holes and adjusted for different spectral ranges. The second one is smart 3D nanostructures for mechanostimulation of T cells that are used for their effective proliferation, with potential application in cancer immunotherapy. This new approach unleashes the potential of bottom-up nanofabrication and paves the way for nanoscale devices and systems in numerous applications.
我们介绍了一种基于干颗粒组装的新型胶体光刻方法，该方法是将颗粒在弹性体上组装成致密的单层，然后机械转移到任何材料和曲率的基底上。此方法既可以手动实施，也可以自动实施，并且能够以非常高的通量生产出具有与最先进的胶体光刻技术相当质量的大面积图案。我们首先展示了周期在200纳米至2微米之间的纳米图案的制造。然后，我们展示了该方法的两个纳米技术应用。第一个是在硅和蓝宝石上制造的抗反射结构，具有不同的几何形状，包括凸块和孔阵列，并针对不同的光谱范围进行了调整。第二个是用于机械刺激T细胞以实现其有效增殖的智能3D纳米结构，在癌症免疫治疗中具有潜在应用。这种新方法释放了自下而上纳米制造的潜力，并为众多应用中的纳米级设备和系统铺平了道路。
