Chèvremont William, Narayanan Theyencheri
ESRF - The European Synchrotron, 71 Avenue des Martyrs, 38043 Grenoble, France.
J Appl Crystallogr. 2024 Mar 29;57(Pt 2):440-445. doi: 10.1107/S1600576724001997. eCollection 2024 Apr 1.
This article describes a correction procedure for the removal of indirect background contributions to measured small-angle X-ray scattering patterns. The high scattering power of a sample in the ultra-small-angle region may serve as a secondary source for a window placed in front of the detector. The resulting secondary scattering appears as a sample-dependent background in the measured pattern that cannot be directly subtracted. This is an intricate problem in measurements at ultra-low angles, which can significantly reduce the useful dynamic range of detection. Two different procedures are presented to retrieve the real scattering profile of the sample.
本文描述了一种校正程序,用于去除测量的小角X射线散射图案中的间接背景贡献。在超小角区域中,样品的高散射能力可能会成为放置在探测器前方的窗口的二次源。由此产生的二次散射在测量图案中表现为与样品相关的背景,无法直接扣除。这是超低角度测量中的一个复杂问题,它会显著降低有用的检测动态范围。本文提出了两种不同的程序来获取样品的真实散射轮廓。