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能否通过伪装下的不同痕迹来识别印象管理或自我监控得分较高与较低的人?

Can People With Higher Versus Lower Scores on Impression Management or Self-Monitoring Be Identified Through Different Traces Under Faking?

作者信息

Röhner Jessica, Thoss Philipp, Uziel Liad

机构信息

University of Bamberg, Germany.

Bar-Ilan University, Israel.

出版信息

Educ Psychol Meas. 2024 Jun;84(3):594-631. doi: 10.1177/00131644231182598. Epub 2023 Jul 2.

Abstract

According to faking models, personality variables and faking are related. Most prominently, people's tendency to try to make an appropriate impression (impression management; IM) and their tendency to adjust the impression they make (self-monitoring; SM) have been suggested to be associated with faking. Nevertheless, empirical findings connecting these personality variables to faking have been contradictory, partly because different studies have given individuals different tests to fake and different faking directions (to fake low vs. high scores). Importantly, whereas past research has focused on faking by examining test scores, recent advances have suggested that the faking process could be better understood by analyzing individuals' responses at the item level (response pattern). Using machine learning (elastic net and random forest regression), we reanalyzed a data set ( = 260) to investigate whether individuals' faked response patterns on extraversion (features; i.e., input variables) could reveal their IM and SM scores. We found that individuals had similar response patterns when they faked, irrespective of their IM scores (excluding the faking of high scores when random forest regression was used). Elastic net and random forest regression converged in revealing that individuals higher on SM differed from individuals lower on SM in how they faked. Thus, response patterns were able to reveal individuals' SM, but not IM. Feature importance analyses showed that whereas some items were faked differently by individuals with higher versus lower SM scores, others were faked similarly. Our results imply that analyses of response patterns offer valuable new insights into the faking process.

摘要

根据伪装模型,人格变量与伪装行为相关。最显著的是,人们试图留下恰当印象的倾向(印象管理;IM)以及调整自身所留印象的倾向(自我监控;SM)被认为与伪装行为有关。然而,将这些人格变量与伪装行为联系起来的实证研究结果相互矛盾,部分原因在于不同的研究让个体进行不同的测试来伪装,且伪装方向也不同(伪装低分与高分)。重要的是,尽管过去的研究通过检查测试分数来关注伪装行为,但最近的进展表明,通过分析个体在项目层面的反应(反应模式),可以更好地理解伪装过程。我们使用机器学习(弹性网络和随机森林回归)重新分析了一个数据集(n = 260),以研究个体在外向性方面的伪装反应模式(特征,即输入变量)是否能够揭示他们的印象管理和自我监控得分。我们发现,个体在伪装时具有相似的反应模式,无论他们的印象管理得分如何(使用随机森林回归时排除伪装高分的情况)。弹性网络和随机森林回归都表明,自我监控得分较高的个体与得分较低的个体在伪装方式上存在差异。因此,反应模式能够揭示个体的自我监控情况,但无法揭示印象管理情况。特征重要性分析表明,虽然一些项目在自我监控得分较高和较低的个体中伪装方式不同,但其他项目的伪装方式相似。我们的结果表明,对反应模式的分析为伪装过程提供了有价值的新见解。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/a44d/11095321/8dd5d3bfce73/10.1177_00131644231182598-fig1.jpg

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