Zhang Yangyang, Chen Yanxu, Wang Xiaowen, Feng Yafei, Dai Zechuan, Cheng Mingyu, Zhang Genqiang
Hefei National Research Center for Physical Sciences at the Microscale, CAS Key Laboratory of Materials for Energy Conversion, Department of Materials Science and Engineering, University of Science and Technology of China, Hefei, Anhui, China.
Nat Commun. 2024 Jun 18;15(1):5172. doi: 10.1038/s41467-024-49247-4.
The carbon-carbon coupling at the Cu/CuO Schottky interface has been widely recognized as a promising approach for electrocatalytic CO conversion into value-added alcohols. However, the limited selectivity of C alcohols persists due to the insufficient control over rectifying interface characteristics required for precise bonding of oxyhydrocarbons. Herein, we present an investigation into the manipulation of the coordination environment of Cu sites through an in-situ electrochemical reconstruction strategy, which indicates that the construction of low-coordinated Cu sites at the Cu/CuO interface facilitates the enhanced rectifying interfaces, and induces asymmetric electronic perturbation and faster electron exchange, thereby boosting C-C coupling and bonding oxyhydrocarbons towards the nucleophilic reaction process of *HCCO-CO. Impressively, the low-coordinated Cu sites at the Cu/CuO interface exhibit superior faradic efficiency of 64.15 ± 1.92% and energy efficiency of ~39.32% for C alcohols production, while maintaining stability for over 50 h (faradic efficiency >50%, total current density = 200 mA cm) in a flow-cell electrolyzer. Theoretical calculations, operando synchrotron radiation Fourier transform infrared spectroscopy, and Raman experiments decipher that the low-coordinated Cu sites at the Cu/CuO interface can enhance the coverage of *CO and adsorption of *CHCO and CHCHO, facilitating the formation of C alcohols.
铜/氧化铜肖特基界面处的碳-碳偶联已被广泛认为是一种将电催化一氧化碳转化为高附加值醇类的有前景的方法。然而,由于对氧烃精确键合所需的整流界面特性控制不足,C醇的选择性仍然有限。在此,我们通过原位电化学重构策略对铜位点的配位环境进行了研究,结果表明在铜/氧化铜界面构建低配位铜位点有助于增强整流界面,并诱导不对称电子扰动和更快的电子交换,从而促进碳-碳偶联以及使氧烃向HCCO-CO的亲核反应过程键合。令人印象深刻的是,铜/氧化铜界面处的低配位铜位点在生产C醇时表现出64.15±1.92%的优异法拉第效率和约39.32%的能量效率,同时在流动池电解槽中保持超过50小时的稳定性(法拉第效率>50%,总电流密度=200 mA cm)。理论计算、原位同步辐射傅里叶变换红外光谱和拉曼实验表明,铜/氧化铜界面处的低配位铜位点可以提高CO的覆盖率以及*CHCO和CHCHO的吸附,促进C醇的形成。