Xu Xiaodong, Ding Zhao, Pu Chunlin, Kong Changchang, Chen Shijunyin, Lu Weiling, Zhang Jianfa
Center for Molecular Metabolism, Nanjing University of Science & Technology, Nanjing, China.
Key Laboratory of Metabolic Engineering and Biosynthesis Technology, Ministry of Industry and Information Technology, Nanjing, China.
Front Pharmacol. 2024 Aug 9;15:1434136. doi: 10.3389/fphar.2024.1434136. eCollection 2024.
Overexposure to ultraviolet (UV) light is known to cause damage to the skin, leading to sunburn and photo-aging. Chemical sunscreen products may give rise to health risks including phototoxicity, photosensitivity, and photosensitivity. Natural polysaccharides have attracted considerable interests due to diverse biological activities.
A novel polysaccharide isolated was purified and structurally characterized using chemical methods followed by HPLC, GLC-MS, as well as 1D and 2D NMR spectroscopy. The photoprotective effect of the EPS on UVB-induced damage was assessed using cultured keratinocytes and using C57BL/6 mouse models.
The average molecular weight of the EPS was 5.48 × 10 Da, composed of glucose, mannose and galactose residues at a ratio of 2:2:1. The repeating units of the EPS were →3)-β-D-Glc (1→3) [β-D-Gal (1→2)-α-D-Glc (1→2)]-α-D-Man (1→3)-α-D-Man (1→. In cultured keratinocytes, the EPS reduced cytotoxicity and excessive ROS production induced by UVB irradiation. The EPS also exhibits an inhibitory effect on oxidative stress, inflammation, and collagen degradation found in the photodamage in mice. H NMR-based metabolomics analysis for skin suggested that the EPS partly reversed the shifts of metabolic profiles of the skin in UVB-exposed mice.
The EPS exhibits skin photoprotective effects through regulating oxidative stress both and . Our findings highlight that the EPS is a potential candidate in sunscreen formulations for an efficient solution to UVB radiation.
已知过度暴露于紫外线（UV）会对皮肤造成损害，导致晒伤和光老化。化学防晒产品可能会带来包括光毒性、光敏性等健康风险。天然多糖因其多样的生物活性而引起了广泛关注。
对分离得到的一种新型多糖进行纯化，并采用化学方法结合高效液相色谱（HPLC）、气相色谱 - 质谱联用（GLC - MS）以及一维和二维核磁共振光谱对其结构进行表征。使用培养的角质形成细胞和C57BL/6小鼠模型评估该胞外多糖（EPS）对紫外线B（UVB）诱导损伤的光保护作用。
该EPS的平均分子量为5.48×10 Da，由葡萄糖、甘露糖和半乳糖残基按2:2:1的比例组成。EPS的重复单元为→3)-β - D - Glc(1→3)[β - D - Gal(1→2)-α - D - Glc(1→2)]-α - D - Man(1→3)-α - D - Man(1→。在培养的角质形成细胞中，EPS降低了UVB照射诱导的细胞毒性和过量活性氧（ROS）的产生。EPS对小鼠光损伤中发现的氧化应激、炎症和胶原蛋白降解也具有抑制作用。基于氢核磁共振（H NMR）的皮肤代谢组学分析表明，EPS部分逆转了UVB照射小鼠皮肤代谢谱的变化。
EPS通过在体外和体内调节氧化应激表现出皮肤光保护作用。我们的研究结果表明，EPS是防晒配方中解决UVB辐射问题的潜在候选物。
