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用于高精度模式识别的具有氧化铟锡电极的氧化锌基忆阻器的增强型模拟开关和神经形态性能。

Enhanced analog switching and neuromorphic performance of ZnO-based memristors with indium tin oxide electrodes for high-accuracy pattern recognition.

作者信息

Ismail Muhammad, Rasheed Maria, Park Yongjin, Lee Sohyeon, Mahata Chandreswar, Shim Wonbo, Kim Sungjun

机构信息

Division of Electronics and Electrical Engineering, Dongguk University, Seoul 04620, Republic of Korea.

Department of Advanced Battery Convergence Engineering, Dongguk University, Seoul 04620, Republic of Korea.

出版信息

J Chem Phys. 2024 Oct 7;161(13). doi: 10.1063/5.0233031.

Abstract

This study systematically investigates analog switching and neuromorphic characteristics in a ZnO-based memristor by varying the anodic top electrode (TE) materials [indium tin oxide (ITO), Ti, and Ta]. Compared with the TE materials (Ti and Ta), memristive devices with TEs made of ITO exhibit dual volatile and nonvolatile switching behavior and multistate switching characteristics assessed based on reset-stop voltage and current compliance (ICC) responses. The polycrystalline structure of the ZnO functional layer sandwiched between ITO electrodes was confirmed by high-resolution transmission electron microscopy analysis. The current transport mechanism in the ZnO-based memristor was dominated by Schottky emission, with the Schottky barrier height modulated from 0.26 to 0.4 V by varying the reset-stop voltage under different ICC conditions. The long-term potentiation and long-term depression synaptic characteristics were successfully mimicked by modulating the pulse amplitudes. Furthermore, a 90.84% accuracy was achieved using a convolutional neural network architecture for Modified National Institute of Standards and Technology pattern categorization, as demonstrated by the confusion matrix. The results demonstrated that the ITO/ZnO/ITO/Si memristor device holds promise for high-performance electronic applications and effective ITO electrode modeling.

摘要

本研究通过改变阳极顶电极(TE)材料[氧化铟锡(ITO)、钛(Ti)和钽(Ta)],系统地研究了基于氧化锌(ZnO)的忆阻器中的模拟开关和神经形态特性。与TE材料(Ti和Ta)相比,采用ITO制成的TE的忆阻器件表现出双挥发性和非挥发性开关行为,以及基于复位停止电压和电流合规性(ICC)响应评估的多态开关特性。通过高分辨率透射电子显微镜分析证实了夹在ITO电极之间的ZnO功能层的多晶结构。基于ZnO的忆阻器中的电流传输机制以肖特基发射为主导,通过在不同ICC条件下改变复位停止电压,肖特基势垒高度从0.26调制到0.4V。通过调制脉冲幅度成功模拟了长期增强和长期抑制突触特性。此外,如混淆矩阵所示,使用卷积神经网络架构对修改后的美国国家标准与技术研究院模式进行分类时,准确率达到了90.84%。结果表明,ITO/ZnO/ITO/Si忆阻器器件在高性能电子应用和有效的ITO电极建模方面具有潜力。

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