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基于铝掺杂氧化镓微带的真空紫外光电探测器的超高光电导增益比(>10)

Ultra-high PDCR(>10) of vacuum-UV photodetector based on Al-doped GaOmicrobelts.

作者信息

Hu Zhi-Pin, Chen Hai-Feng, Ding Zi-Jie, Lu Qin, Li Li-Jun, Liu Xiang-Tai, Wang Shao-Qing, Wang Zhan, Jia Yi-Fan

机构信息

Key Laboratory of Advanced Semiconductor Devices and Materials, School of Electronic Engineering, Xi'an University of Posts and Telecommunications, Xi'an 710121, People's Republic of China.

出版信息

Nanotechnology. 2024 Oct 21;36(2). doi: 10.1088/1361-6528/ad84ff.

Abstract

Al-doped GaOmicrobelts with widths ranging from 20 to 154m and lengths up to 2 mm were grown using carbothermal reduction. Based on these ultra-wide microbelts, single-microbelt (37m wide) and double-microbelts(38m/42m wide) metal-semiconductor-metal photoconductive ultraviolet (UV) detectors PDs were fabricated and their optoelectronic performances were investigated at Vacuum-UV (VUV) wavelengths of 185 nm. Under irradiation of 185 nm, the Al-doped GaOPD has a very-high photocurrent () of 192.07A and extremely low dark current () of 156 fA at 10 V, and presents a ultra-high light-to-dark current ratio of 1.23 × 10. The responsivity (), external quantum efficiency (EQE), and detectivity () of the double-microbelts detector device were 1920 A W, 9.36 × 10%, and 8.6 × 10Jones, respectively. Since the bandgap of the Al-doped microbelts becomes wider, and the fabricated detector has weaker sensitivity to radiation in the 254/365 nm wavelengths. Compared with the 254 nm and 365 nm UV cases, the devices under 185 nm VUV show the excellent high selectivity ratios of 1.47 × 10and 1.7× 10, respectively. This paper should provide a new insight on the VUV photodetectors utilizing GaOmicrobelts.

摘要

采用碳热还原法生长了宽度为20至154μm、长度达2mm的掺铝氧化镓微带。基于这些超宽微带,制作了单微带(宽37μm)和双微带(宽38μm/42μm)金属-半导体-金属光导紫外(UV)探测器,并在185nm的真空紫外(VUV)波长下研究了它们的光电性能。在185nm照射下,掺铝氧化镓探测器在10V时具有192.07μA的非常高的光电流()和156fA的极低暗电流(),呈现出1.23×10的超高亮暗电流比。双微带探测器器件的响应度()、外量子效率(EQE)和探测率()分别为1920μA/W、9.36×10%和8.6×10Jones。由于掺铝微带的带隙变宽,所制作的探测器对254/365nm波长的辐射灵敏度较低。与254nm和365nm紫外情况相比,185nm VUV下的器件分别显示出1.47×10和1.7×10的优异高选择性比。本文应为利用氧化镓微带的VUV光电探测器提供新的见解。

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