Hu Zhi-Pin, Chen Hai-Feng, Ding Zi-Jie, Lu Qin, Li Li-Jun, Liu Xiang-Tai, Wang Shao-Qing, Wang Zhan, Jia Yi-Fan
Key Laboratory of Advanced Semiconductor Devices and Materials, School of Electronic Engineering, Xi'an University of Posts and Telecommunications, Xi'an 710121, People's Republic of China.
Nanotechnology. 2024 Oct 21;36(2). doi: 10.1088/1361-6528/ad84ff.
Al-doped GaOmicrobelts with widths ranging from 20 to 154m and lengths up to 2 mm were grown using carbothermal reduction. Based on these ultra-wide microbelts, single-microbelt (37m wide) and double-microbelts(38m/42m wide) metal-semiconductor-metal photoconductive ultraviolet (UV) detectors PDs were fabricated and their optoelectronic performances were investigated at Vacuum-UV (VUV) wavelengths of 185 nm. Under irradiation of 185 nm, the Al-doped GaOPD has a very-high photocurrent () of 192.07A and extremely low dark current () of 156 fA at 10 V, and presents a ultra-high light-to-dark current ratio of 1.23 × 10. The responsivity (), external quantum efficiency (EQE), and detectivity () of the double-microbelts detector device were 1920 A W, 9.36 × 10%, and 8.6 × 10Jones, respectively. Since the bandgap of the Al-doped microbelts becomes wider, and the fabricated detector has weaker sensitivity to radiation in the 254/365 nm wavelengths. Compared with the 254 nm and 365 nm UV cases, the devices under 185 nm VUV show the excellent high selectivity ratios of 1.47 × 10and 1.7× 10, respectively. This paper should provide a new insight on the VUV photodetectors utilizing GaOmicrobelts.
采用碳热还原法生长了宽度为20至154μm、长度达2mm的掺铝氧化镓微带。基于这些超宽微带,制作了单微带(宽37μm)和双微带(宽38μm/42μm)金属-半导体-金属光导紫外(UV)探测器,并在185nm的真空紫外(VUV)波长下研究了它们的光电性能。在185nm照射下,掺铝氧化镓探测器在10V时具有192.07μA的非常高的光电流()和156fA的极低暗电流(),呈现出1.23×10的超高亮暗电流比。双微带探测器器件的响应度()、外量子效率(EQE)和探测率()分别为1920μA/W、9.36×10%和8.6×10Jones。由于掺铝微带的带隙变宽,所制作的探测器对254/365nm波长的辐射灵敏度较低。与254nm和365nm紫外情况相比,185nm VUV下的器件分别显示出1.47×10和1.7×10的优异高选择性比。本文应为利用氧化镓微带的VUV光电探测器提供新的见解。