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亚价键与掺杂剂轨道之间的相互作用有助于碲化锡热电材料的设计。

Interplay between metavalent bonds and dopant orbitals enables the design of SnTe thermoelectrics.

作者信息

Tang Guodong, Liu Yuqi, Yang Xiaoyu, Zhang Yongsheng, Nan Pengfei, Ying Pan, Gong Yaru, Zhang Xuemei, Ge Binghui, Lin Nan, Miao Xuefei, Song Kun, Schön Carl-Friedrich, Cagnoni Matteo, Kim Dasol, Yu Yuan, Wuttig Matthias

机构信息

National Key Laboratory of Advanced Casting Technologies, MIIT Key Laboratory of Advanced Metallic and Intermetallic Materials Technology, Engineering Research Center of Materials Behavior and Design, Ministry of Education, Nanjing University of Science and Technology, Nanjing, 210094, China.

Key Laboratory of Structure and Functional Regulation of Hybrid Materials of Ministry of Education, Institutes of Physical Science and Information Technology, Anhui University, Hefei, 230601, China.

出版信息

Nat Commun. 2024 Oct 23;15(1):9133. doi: 10.1038/s41467-024-53599-2.

Abstract

Engineering the electronic band structures upon doping is crucial to improve the thermoelectric performance of materials. Understanding how dopants influence the electronic states near the Fermi level is thus a prerequisite to precisely tune band structures. Here, we demonstrate that the Sn-s states in SnTe contribute to the density of states at the top of the valence band. This is a consequence of the half-filled p-p σ-bond (metavalent bonding) and its resulting symmetry of the orbital phases at the valence band maximum (L point of the Brillouin zone). This insight provides a recipe for identifying superior dopants. The overlap between the dopant s- and the Te p-state is maximized, if the spatial overlap of both orbitals is maximized and their energetic difference is minimized. This simple design rule has enabled us to screen out Al as a very efficient dopant to enhance the local density of states for SnTe. In conjunction with doping Sb to tune the carrier concentration and alloying with AgBiTe to promote band convergence, as well as introducing dislocations to impede phonon propagation, a record-high average ZT of 1.15 between 300 and 873 K and a large ZT of 0.36 at 300 K is achieved in SnAlSbTe-4%AgBiTe.

摘要

通过掺杂来调控电子能带结构对于提高材料的热电性能至关重要。因此,了解掺杂剂如何影响费米能级附近的电子态是精确调控能带结构的先决条件。在此,我们证明了SnTe中的Sn - s态对价带顶部的态密度有贡献。这是半填充的p - p σ键(变价键合)及其在价带最大值(布里渊区的L点)处产生的轨道相位对称性的结果。这一见解为识别优质掺杂剂提供了方法。如果两种轨道的空间重叠最大化且它们的能量差最小化,那么掺杂剂的s态与Te的p态之间的重叠就会最大化。这一简单的设计规则使我们能够筛选出Al作为一种非常有效的掺杂剂,以提高SnTe的局域态密度。结合掺杂Sb来调节载流子浓度、与AgBiTe合金化以促进能带收敛以及引入位错来阻碍声子传播,在SnAlSbTe - 4%AgBiTe中实现了300至873 K之间创纪录的平均ZT值1.15以及300 K时0.36的大ZT值。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/4baf/11500016/ddf48c3faf29/41467_2024_53599_Fig1_HTML.jpg

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