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通过铂界面工程实现FeNi/Pt/BiSe三层膜中的大单向自旋霍尔磁电阻效应

Large unidirectional spin Hall magnetoresistance in FeNi/Pt/BiSe trilayers by Pt interfacial engineering.

作者信息

Zhang Qi, Tao Kun, Jia Chenglong, Xu Guofu, Chai Guozhi, Zuo Yalu, Cui Baoshan, Yang Dezheng, Xue Desheng, Xi Li

机构信息

Key Laboratory for Magnetism and Magnetic Materials of Ministry of Education, School of Physical Science and Technology, Lanzhou University, Lanzhou, PR China.

出版信息

Nat Commun. 2024 Nov 1;15(1):9450. doi: 10.1038/s41467-024-53884-0.

DOI:10.1038/s41467-024-53884-0
PMID:39487155
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC11530670/
Abstract

Unidirectional spin Hall magnetoresistance (USMR) has emerged as a promising candidate for magnetoresistive random-access memory (MRAM) technology. However, the realization of high signal-to-noise output signal in USMR devices has remained a challenge, primarily due to the limited USMR effect at room temperature. In this study, we report a large USMR effect in FeNi/Pt/Bi₂Se₃ trilayers through interfacial engineering with Pt to optimize the spin current transmission efficiency and electron-magnon scattering. Our devices exhibit a USMR value that is an order of magnitude higher than previously reported systems, reaching 30.6 ppm/MA/cm² at room temperature. First-principles calculations and experimental observations suggest that the Pt layer not only preserves the spin-momentum locked topological surface states in Bi₂Se₃ at the Fermi-level but also generates additional Rashba surface states within the Pt itself to enhance the effective SOT efficiency. Furthermore, we demonstrate that the two-terminal USMR-MRAM devices show robust output performance with 2 harmonic resistance variation around 0.11 Ω/mA. Remarkably, the performance of these devices further improves at elevated temperatures, highlighting their potential for reliable operation in a wide range of environmental conditions. Our findings pave the way for future advancements in high-performance, energy-efficient spintronic memory devices.

摘要

单向自旋霍尔磁电阻(USMR)已成为磁阻随机存取存储器(MRAM)技术的一个有前景的候选者。然而,在USMR器件中实现高信噪比输出信号仍然是一个挑战,主要原因是室温下USMR效应有限。在本研究中,我们通过与铂进行界面工程来优化自旋电流传输效率和电子 - 磁振子散射,报道了FeNi/Pt/Bi₂Se₃三层膜中存在大的USMR效应。我们的器件展现出的USMR值比之前报道的系统高一个数量级,在室温下达到30.6 ppm/MA/cm²。第一性原理计算和实验观察表明,铂层不仅在费米能级处保留了Bi₂Se₃中自旋 - 动量锁定的拓扑表面态,还在铂自身内部产生了额外的Rashba表面态,以提高有效自旋轨道转矩(SOT)效率。此外,我们证明两终端USMR - MRAM器件具有稳健的输出性能,二次谐波电阻变化约为0.11Ω/mA。值得注意的是,这些器件在升高温度时性能进一步提升,突出了它们在广泛环境条件下可靠运行的潜力。我们的发现为高性能、节能自旋电子存储器件的未来发展铺平了道路。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2f4a/11530670/0e79ff14bb59/41467_2024_53884_Fig4_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2f4a/11530670/3c885ffd2b55/41467_2024_53884_Fig1_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2f4a/11530670/dcc84f8fffcf/41467_2024_53884_Fig2_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2f4a/11530670/f719e787a012/41467_2024_53884_Fig3_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2f4a/11530670/0e79ff14bb59/41467_2024_53884_Fig4_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2f4a/11530670/3c885ffd2b55/41467_2024_53884_Fig1_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2f4a/11530670/dcc84f8fffcf/41467_2024_53884_Fig2_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2f4a/11530670/f719e787a012/41467_2024_53884_Fig3_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2f4a/11530670/0e79ff14bb59/41467_2024_53884_Fig4_HTML.jpg

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