Kawaguchi Naoto, Shibata Kiyou, Mizoguchi Teruyasu
Department of Materials Science and Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo, Tokyo, 113-8656, Japan.
Institute of Industrial Science, The University of Tokyo, 4-6-1 Komaba, Meguro, Tokyo, 153-8505, Japan.
Sci Data. 2024 Nov 18;11(1):1244. doi: 10.1038/s41597-024-04008-2.
Here we provide a database comprising electronic band structures of 9,004 layered intercalation compounds, where atoms are intercalated into a host layered compound with different intercalant atoms, along with 468 structures related to the layered host compounds. Additionally, we provide properties derived from the electronic states such as band gap as well as stability-related properties like formation energies. Direct comparison of the band structures before and after intercalation is generally challenging due to changes in their space group and k-path. However, in this study, we developed new k-paths consistent with the host materials, allowing for the direct comparison of band structures before and after intercalation. This enables direct and quantitative discussion of the band structure changes induced by the intercalations and provides a valuable database for intercalant-driven band engineering. Layered intercalation compounds are widely used in many fields, including superconductivity and energy applications, and understanding of electronic structures is necessary. The feature of our database holds promises for the development of layered compounds with enhanced functionalities through database utilization.
在此,我们提供了一个数据库,其中包含9004种层状插层化合物的电子能带结构,这些化合物是通过不同的插层原子插入到主体层状化合物中形成的,同时还包含468种与层状主体化合物相关的结构。此外,我们还提供了从电子态导出的性质,如带隙,以及与稳定性相关的性质,如形成能。由于插层前后空间群和k路径的变化,直接比较插层前后的能带结构通常具有挑战性。然而,在本研究中,我们开发了与主体材料一致的新k路径,从而能够直接比较插层前后的能带结构。这使得我们能够直接和定量地讨论插层引起的能带结构变化,并为插层剂驱动的能带工程提供了一个有价值的数据库。层状插层化合物广泛应用于许多领域,包括超导和能源应用,因此对其电子结构的理解是必要的。我们数据库的特点有望通过数据库的利用来开发具有增强功能的层状化合物。