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在高垂直温度梯度下使用物理气相传输法并以破碎的化学气相沉积碳化硅块生长碳化硅单晶

Growths of SiC Single Crystals Using the Physical Vapor Transport Method with Crushed CVD-SiC Blocks Under High Vertical Temperature Gradients.

作者信息

Sun Ju-Hyeong, Park Jae-Hyeon, Bae Si-Young, Shin Yun-Ji, Kwon Yong-Jin, Lee Won-Jae, Kwon Se-Hun, Jeong Seong-Min

机构信息

Semiconductor Materials Center, Korea Institute of Ceramic Engineering and Technology (KICET), Jinju 52851, Republic of Korea.

School of Materials Science and Engineering, Pusan National University, Busan 46241, Republic of Korea.

出版信息

Materials (Basel). 2024 Nov 26;17(23):5789. doi: 10.3390/ma17235789.

DOI:10.3390/ma17235789
PMID:39685225
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC11641864/
Abstract

A recent study reported the rapid growth of SiC single crystals of ~1.5 mm/h using high-purity SiC sources obtained by recycling CVD-SiC blocks used as materials in semiconductor processes. This method has gained attention as a way to improve the productivity of the physical vapor transport (PVT) method, widely used for manufacturing single crystal substrates for power semiconductors. When recycling CVD-SiC blocks by crushing them for use as sources for growing SiC single crystals, the properties and the particle size distribution of the material differ from those of conventional commercial SiC powders, making it necessary to study their effects. Therefore, in this study, SiC single crystals were grown using the PVT method with crushed CVD-SiC blocks of various sizes as the source material, and the growth behavior was analyzed. Simulation results of the temperature distribution in the PVT system confirmed that using large, crushed blocks as the SiC source material generates a greater temperature gradient within the source compared to conventional commercial SiC powder, making it advantageous for rapid growth processes. Additionally, when the large, crushed blocks were vertically aligned, good crystal quality was experimentally achieved at high growth rates, even under non-optimized growth conditions.

摘要

最近的一项研究报告称,使用通过回收半导体工艺中用作材料的CVD-SiC块获得的高纯度SiC源,SiC单晶的生长速度可达约1.5毫米/小时。作为提高物理气相传输(PVT)方法生产率的一种方式,该方法已受到关注,PVT方法广泛用于制造功率半导体的单晶衬底。当通过粉碎CVD-SiC块来回收它们以用作生长SiC单晶的源时,材料的性质和粒度分布与传统商业SiC粉末不同,因此有必要研究它们的影响。因此,在本研究中,使用PVT方法以各种尺寸的粉碎CVD-SiC块作为源材料生长SiC单晶,并分析生长行为。PVT系统中温度分布的模拟结果证实,与传统商业SiC粉末相比,使用大的粉碎块作为SiC源材料会在源内产生更大的温度梯度,这有利于快速生长过程。此外,当大的粉碎块垂直排列时,即使在非优化的生长条件下,也能在高生长速率下通过实验获得良好的晶体质量。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/a2ec/11641864/a90d4b866606/materials-17-05789-g008.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/a2ec/11641864/e3607c4e2868/materials-17-05789-g001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/a2ec/11641864/de7d7a391126/materials-17-05789-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/a2ec/11641864/cdd30e519cb0/materials-17-05789-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/a2ec/11641864/9ebdf0ec3a90/materials-17-05789-g004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/a2ec/11641864/9685017dd0e8/materials-17-05789-g005a.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/a2ec/11641864/e3738a260290/materials-17-05789-g006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/a2ec/11641864/c2dcc46fabdb/materials-17-05789-g007.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/a2ec/11641864/a90d4b866606/materials-17-05789-g008.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/a2ec/11641864/e3607c4e2868/materials-17-05789-g001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/a2ec/11641864/de7d7a391126/materials-17-05789-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/a2ec/11641864/cdd30e519cb0/materials-17-05789-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/a2ec/11641864/9ebdf0ec3a90/materials-17-05789-g004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/a2ec/11641864/9685017dd0e8/materials-17-05789-g005a.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/a2ec/11641864/e3738a260290/materials-17-05789-g006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/a2ec/11641864/c2dcc46fabdb/materials-17-05789-g007.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/a2ec/11641864/a90d4b866606/materials-17-05789-g008.jpg

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本文引用的文献

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RSC Adv. 2022 Jul 8;12(31):19936-19945. doi: 10.1039/d2ra02875a. eCollection 2022 Jul 6.
2
Optimization of the SiC Powder Source Material for Improved Process Conditions During PVT Growth of SiC Boules.用于改善碳化硅晶锭物理气相传输生长过程条件的碳化硅粉末原料优化
Materials (Basel). 2019 Oct 8;12(19):3272. doi: 10.3390/ma12193272.