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通过超薄TiO涂层增强生物医学Ti-6Al-4V合金上阳极纳米管结构的生物相容性

Enhancement of biocompatibility of anodic nanotube structures on biomedical Ti-6Al-4V alloy via ultrathin TiO coatings.

作者信息

Sepúlveda Marcela, Capek Jan, Baishya Kaushik, Rodriguez-Pereira Jhonatan, Bacova Jana, Jelinkova Stepanka, Zazpe Raul, Sopha Hanna, Rousar Tomas, Macak Jan M

机构信息

Center of Materials and Nanotechnologies, Faculty of Chemical Technology, University of Pardubice, Pardubice, Czechia.

Central European Institute of Technology, Brno University of Technology, Brno, Czechia.

出版信息

Front Bioeng Biotechnol. 2024 Dec 2;12:1515810. doi: 10.3389/fbioe.2024.1515810. eCollection 2024.

Abstract

This work aims to describe the effect of the surface modification of TiO nanotube (TNT) layers on Ti-6Al-4V (TiAlV) alloy by ultrathin TiO coatings prepared via Atomic Layer Deposition (ALD) on the growth of MG-63 osteoblastic cells. The TNT layers with two distinctly different inner diameters, namely ∼15 nm and ∼50 nm, were prepared via anodic oxidation of the TiAlV alloy. Flat, i.e., non-anodized, TiAlV alloy foils were used as reference substrates. Additionally, a part of the TNT layers and alloy foils was coated with ultrathin coatings of TiO by ALD. The number of TiO ALD cycles used was 1 and 5 leading to a nominal TiO thickness of ∼0.055 and ∼0.3 nm, respectively. The ultrathin TiO coating by ALD enabled to optimize the surface hydrophilicity for optimal cell growth. In addition, coatings shaded impurities of V- and F-based species (stemming from the alloy and the anodization electrolyte) that affect the biocompatibility of the tested materials while preserving the original structure and morphology. The evaluation of the biocompatibility before and after TiO ALD coating on TiAlV flat surfaces and TNT layers was carried out using MG-63 osteoblastic cells and compared after incubation for up to 96 h. The cell growth, adhesion, and proliferation of the MG-63 on TiAlV foils and TNT layers showed significant enhancement after the surface modification by TiO ALD.

摘要

本工作旨在描述通过原子层沉积(ALD)制备的超薄TiO涂层对Ti-6Al-4V(TiAlV)合金上的TiO纳米管(TNT)层进行表面改性,对MG-63成骨细胞生长的影响。通过对TiAlV合金进行阳极氧化制备了两种内径明显不同的TNT层,即15 nm和50 nm。平整的、即未阳极氧化的TiAlV合金箔用作参考基底。此外,部分TNT层和合金箔通过ALD用TiO超薄涂层进行了涂覆。使用的TiO ALD循环次数为1次和5次,分别导致标称TiO厚度约为0.055 nm和~0.3 nm。通过ALD制备的超薄TiO涂层能够优化表面亲水性以实现最佳细胞生长。此外,涂层遮蔽了影响测试材料生物相容性的V基和F基杂质(源自合金和阳极氧化电解液),同时保留了原始结构和形态。使用MG-63成骨细胞对TiAlV平面和TNT层上的TiO ALD涂层前后的生物相容性进行了评估,并在孵育长达96小时后进行了比较。通过TiO ALD进行表面改性后,MG-63在TiAlV箔和TNT层上的细胞生长、粘附和增殖均显著增强。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ae4c/11646768/a9c7c56506ef/fbioe-12-1515810-g001.jpg

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