利用扫描电子显微镜（SEM）和原子力显微镜（AFM）的电模式对复合石墨烯膜进行的定性研究。
Qualitative Research of Composite Graphene Membranes Using the Electric Mode in SEM and AFM.
作者信息
Romaniak Grzegorz, Dybowski Konrad, Kołodziejczyk Łukasz, Kowalczyk Paulina
机构信息
Faculty of Mechanical Engineering, Institute of Materials Science and Engineering, Lodz University of Technology, 1/15 Stefanowskiego St., 90-924 Lodz, Poland.
出版信息
Materials (Basel). 2025 Jan 3;18(1):163. doi: 10.3390/ma18010163.
The development of new graphene-based materials necessitates the application of suitable material imaging techniques, especially for the identification of defects in the graphene structure and its continuity. For this purpose, it is natural to use one of the main properties of graphene-electrical conductivity. In this work, we prepare a 9 cm large-area monolayer graphene membrane on porous scaffolding sealed with either GO or rGO. Then, we use electrostatic force microscopy (EFM) AFM mode along with SE and AEE SEM modes to characterize the as-prepared graphene membranes thoroughly. The combination of SEM-AEE and AFM-EFM techniques not only assesses the quality of graphene itself but also characterizes the selectivity and effectiveness of masking graphene layer defects by applying GO or rGO. This makes these methods valuable in optimizing the production of advanced graphene nanocomposites such as semipermeable membranes.
新型石墨烯基材料的开发需要应用合适的材料成像技术，特别是用于识别石墨烯结构中的缺陷及其连续性。为此，利用石墨烯的主要特性之一——导电性是很自然的。在这项工作中，我们在由氧化石墨烯（GO）或还原氧化石墨烯（rGO）密封的多孔支架上制备了一个9平方厘米的大面积单层石墨烯膜。然后，我们使用静电力显微镜（EFM）的原子力显微镜（AFM）模式以及扫描电子显微镜（SE）和角度能量损失谱（AEE）的扫描电子显微镜（SEM）模式来全面表征所制备的石墨烯膜。扫描电子显微镜-角度能量损失谱（SEM-AEE）和原子力显微镜-静电力显微镜（AFM-EFM）技术的结合不仅评估了石墨烯本身的质量，还通过应用氧化石墨烯（GO）或还原氧化石墨烯（rGO）来表征掩盖石墨烯层缺陷的选择性和有效性。这使得这些方法在优化先进石墨烯纳米复合材料（如半透膜）的生产中具有重要价值。
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