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掺有第Ⅴ族非金属元素(N、P、As)的具有S空位缺陷的单层MoS:第一性原理研究

Monolayer MoS with S vacancy defects doped with Group V non-metallic elements (N, P, As): a first-principles study.

作者信息

Zhang Junxiang, Zhao Xia, Yang Yan, Cui Jiayu

机构信息

Kunshan Water Affairs Bureau, Shanghai, China.

National Environmental Protection Research Institute for Electric Power, Beijing, China.

出版信息

J Mol Model. 2025 Jan 27;31(2):64. doi: 10.1007/s00894-025-06290-2.

Abstract

CONTEXT

This study systematically investigated the effects of single S-atom vacancy defects and composite defects (vacancy combined with doping) on the properties of MoS using density functional theory. The results revealed that N-doped S-vacancy MoS has the smallest composite defect formation energy, indicating its highest stability. Doping maintained the direct band gap characteristic, with shifts in the valence band top. The Fermi level slightly shifted down in N- and P-doped systems, with N-doped MoS showing a larger increase in valence band top energy. Doping also significantly altered the density of states at the Fermi level and weakened the dielectric properties of MoS. The maximum dielectric peaks of doped systems appeared near 2.7 eV with reduced intensities and red-shifted energies. Optical properties were significantly changed, with decreased reflectance, narrower reflectance spectra, and blue-shifted absorption spectra. These findings suggest that introducing composite defects can effectively reduce the forbidden bandwidth of MoS, enhancing electrical conductivity. This research provides theoretical guidance for novel material design and offers insights into composite defect behavior in other two-dimensional materials.

METHODS

The Materials-Studio CASTEP module was used to calculate density functional theory (DFT). A plane wave ultrasoft pseudopotential is used to optimize the crystal structure, and the generalized gradient approximation (GGA) in the form of Perdew-Burke-Ernzerhof (PBE) is used to characterize the exchange correlation energy. After the convergence test, the truncation energy and dot settings were finally selected to be 450 eV and 3 × 3 × 1, respectively, the convergence accuracy was set to 1.0e-5eV/atom, and the convergence criterion for the interatomic interaction force was 0.02 eV/Å. The parameters were all at or better than the accuracy settings. The vacuum layer between the layers was set to 18 Å to avoid interactions caused by the periodic calculation method.

摘要

背景

本研究利用密度泛函理论系统地研究了单个S原子空位缺陷和复合缺陷(空位与掺杂相结合)对MoS性质的影响。结果表明,N掺杂的S空位MoS具有最小的复合缺陷形成能,表明其具有最高的稳定性。掺杂保持了直接带隙特性,价带顶发生了移动。在N和P掺杂体系中,费米能级略有下移,N掺杂的MoS价带顶能量增加较大。掺杂还显著改变了费米能级处的态密度,并削弱了MoS的介电性能。掺杂体系的最大介电峰出现在2.7 eV附近,强度降低且能量红移。光学性质发生了显著变化,反射率降低,反射光谱变窄,吸收光谱蓝移。这些发现表明,引入复合缺陷可以有效降低MoS的禁带宽度,提高电导率。本研究为新型材料设计提供了理论指导,并为其他二维材料中的复合缺陷行为提供了见解。

方法

使用Materials-Studio CASTEP模块来计算密度泛函理论(DFT)。采用平面波超软赝势优化晶体结构,采用Perdew-Burke-Ernzerhof(PBE)形式的广义梯度近似(GGA)来表征交换相关能。经过收敛测试后,最终选择截断能量和点设置分别为450 eV和3×3×1,收敛精度设置为1.0e-5eV/原子,原子间相互作用力的收敛标准为0.02 eV/Å。所有参数均达到或优于精度设置。层间真空层设置为18 Å,以避免周期性计算方法引起的相互作用。

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