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通过表面应变将金属卤化物钙钛矿中的电荷发射浅陷阱增强100倍以上。

Enhancing Charge-Emitting Shallow Traps in Metal Halide Perovskites by >100 Times by Surface Strain.

作者信息

Zhou Ying, Zhang Hengkai, Xian Yeming, Shi Zhifang, Aboa Jean Noalick, Fei Chengbin, Yang Guang, Li Nengxu, Selim Farida A, Yan Yanfa, Huang Jinsong

机构信息

Department of Applied Physical Sciences, University of North Carolina at Chapel Hill, Chapel Hill, NC 27599, USA.

Department of Physics and Astronomy and Wright Center for Photovoltaics Innovation and Commercialization, The University of Toledo, Toledo, OH 43606, USA.

出版信息

Joule. 2025 Jan 15;9(1). doi: 10.1016/j.joule.2024.10.004. Epub 2024 Oct 25.

Abstract

The low density of deep trapping defects in metal halide perovskites (MHPs) is essential for high-performance optoelectronic devices. Shallow traps in MHPs are speculated to enhance charges recombination lifetime. However, it is unknown about the shallow trap chemical nature and distribution, and impact on solar cell operation. Herein, we report that shallow traps are much richer in MHPs than traditional semiconductors. Their density can be enhanced by >100 times through local surface strain, indicating shallow traps mainly located at the surface. The surface strain is introduced by anchoring two-amine-terminated molecules onto formamidinium cations, and the shallow traps are formed by the band edge downshifting toward defect levels. The high-density shallow traps temporarily hold one type of charges and increased concentration of the other type of free carrier in working solar cells by keeping photogenerated charges from bimolecular recombination, resulting in reduced open circuit voltage loss to 317 mV.

摘要

金属卤化物钙钛矿(MHP)中深俘获缺陷的低密度对于高性能光电器件至关重要。据推测,MHP中的浅陷阱可延长电荷复合寿命。然而,浅陷阱的化学性质、分布以及对太阳能电池运行的影响尚不清楚。在此,我们报告MHP中的浅陷阱比传统半导体丰富得多。通过局部表面应变,其密度可提高100倍以上,表明浅陷阱主要位于表面。表面应变是通过将双胺封端分子锚定在甲脒阳离子上引入的,浅陷阱是由能带边缘向缺陷能级下移形成的。高密度浅陷阱在工作太阳能电池中暂时捕获一种电荷并增加另一种自由载流子的浓度,通过防止光生电荷的双分子复合,导致开路电压损失降低至317 mV。

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