磁控溅射在铝合金基底上沉积的Ag-In-Cu薄膜的光学性质和热稳定性

Optical Properties and Thermal Stability of Ag-In-Cu Film on Aluminum Alloy Substrate Deposited by Magnetron Sputtering.

作者信息

Zhao Xiaojun, Wang Xinyue, Liu Ke, Jiang Yuxiang, Peng Zhenwu, Zhou Yuchi, Qian Zhonglin, Li Wei, Lu Lekang, Xiao Lairong, Cai Zhenyang

机构信息

School of Materials Science and Engineering, Central South University, Changsha 410083, China.

State Key Laboratory of Powder Metallurgy, Ministry of Education, Central South University, Changsha 410083, China.

出版信息

Materials (Basel). 2025 Mar 17;18(6):1318. doi: 10.3390/ma18061318.

DOI:10.3390/ma18061318

PMID:40141601

原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC11944093/

Abstract

High-reflectivity metallic films on aluminum substrates are crucial in advanced aerospace and military applications due to their excellent reflectivity and workability. In order to further improve the reflectivity and thermal stability of films, this study investigated the deposition of AgInCu (x = 1, 3, and 5 wt.%) films on Al 6061 alloy substrates using magnetron sputtering, exploring the impact of deposition parameters and composition on their optical properties and thermal stability. Increased copper content improved thermal stability, while it compromised reflectivity. Additionally, increasing deposition power and time initially enhanced reflectivity, but beyond an optimal point, it decreased. Therefore, the AgInCu films deposited at 30 W for 2 min exhibited the highest reflectivity of 99.8% in the near-infrared range, making them promising candidates for reflective films in next-generation optical applications.

摘要

铝基高反射率金属膜因其优异的反射率和可加工性在先进航空航天和军事应用中至关重要。为了进一步提高薄膜的反射率和热稳定性，本研究利用磁控溅射研究了AgInCu（x = 1、3和5 wt.%）薄膜在Al 6061合金基底上的沉积，探讨了沉积参数和成分对其光学性能和热稳定性的影响。铜含量的增加提高了热稳定性，但降低了反射率。此外，增加沉积功率和时间最初会提高反射率，但超过最佳点后则会降低。因此，在30 W下沉积2分钟的AgInCu薄膜在近红外范围内表现出99.8%的最高反射率，使其成为下一代光学应用中反射膜的有前途的候选材料。