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通过引入带有苯基侧基的聚硅氧烷来制备低介电损耗正切的聚酰亚胺。

Development of Polyimides with Low Dielectric Loss Tangent by Incorporating Polysiloxanes with Phenyl Side Groups.

作者信息

Takahashi Riku, Sawada Ririka, Hatakeyama-Sato Kan, Nabae Yuta, Ando Shinji, Hayakawa Teruaki

机构信息

Department of Materials Science and Engineering, School of Materials and Chemical Technology, Institute of Science Tokyo, S8-36 2-12-1 Ookayama, Meguro-ku, Tokyo, 152-8552, Japan.

Department of Chemical Science and Engineering, School of Materials and Chemical Technology, Institute of Science Tokyo, 2-12-1 Ookayama, Meguro-ku, Tokyo, 152-8552, Japan.

出版信息

Macromol Rapid Commun. 2025 Jun;46(12):e2500115. doi: 10.1002/marc.202500115. Epub 2025 Apr 7.

DOI:10.1002/marc.202500115
PMID:40193067
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC12183146/
Abstract

Owing to their low dielectric constant (D), processability, and mechanical properties, siloxane-based polymers have attracted attention as insulating materials for next-generation communication. However, a major challenge regarding siloxane-containing materials is their high dielectric loss tangent (dissipation factor) (D). A polymer is designed and synthesized by combining polysiloxanes with phenyl side groups on the main chain and a polyimide structure (polysiloxane-imide) to improve the D value. Compared with conventional dimethylsiloxane-based polymers, the resulting polysiloxane-imide, obtained as a bendable, self-supporting film, exhibits a significantly reduced D value. The rigidity of the phenyl group-containing polysiloxane presumably contributes to the improvement in the D value. Furthermore, polysiloxane-imides exhibit excellent hydrophobicity and high heat resistance with their 5% weight loss temperature of over 400 °C. The synthesized polysiloxane-imides with phenyl side groups, which possess various properties, including low D, low D, and excellent hydrophobicity, are expected to contribute to the future practical application of siloxane-based insulating materials.

摘要

由于其低介电常数（D）、可加工性和机械性能，硅氧烷基聚合物作为下一代通信的绝缘材料受到了关注。然而，含硅氧烷材料的一个主要挑战是其高介电损耗角正切（耗散因数）（D）。通过将主链上带有苯基侧基的聚硅氧烷与聚酰亚胺结构（聚硅氧烷 - 酰亚胺）相结合来设计和合成一种聚合物，以改善D值。与传统的基于二甲基硅氧烷的聚合物相比，所得的聚硅氧烷 - 酰亚胺以可弯曲的自支撑膜形式获得，其D值显著降低。含苯基聚硅氧烷的刚性大概有助于D值的改善。此外，聚硅氧烷 - 酰亚胺表现出优异的疏水性和高耐热性，其5%失重温度超过400°C。合成的带有苯基侧基的聚硅氧烷 - 酰亚胺具有包括低D、低D和优异疏水性在内的各种性能，有望为硅氧烷基绝缘材料的未来实际应用做出贡献。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/663c/12183146/ecf01d807fe6/MARC-46-2500115-g007.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/663c/12183146/63cccccb09b1/MARC-46-2500115-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/663c/12183146/0769570abad9/MARC-46-2500115-g010.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/663c/12183146/88733113b5a3/MARC-46-2500115-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/663c/12183146/8962d1d2811a/MARC-46-2500115-g001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/663c/12183146/3103fc562237/MARC-46-2500115-g006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/663c/12183146/3d200e0226f3/MARC-46-2500115-g005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/663c/12183146/bd39c37fb3ad/MARC-46-2500115-g011.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/663c/12183146/90fb2f2c943e/MARC-46-2500115-g008.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/663c/12183146/2c123e7107e2/MARC-46-2500115-g009.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/663c/12183146/ecf01d807fe6/MARC-46-2500115-g007.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/663c/12183146/63cccccb09b1/MARC-46-2500115-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/663c/12183146/0769570abad9/MARC-46-2500115-g010.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/663c/12183146/88733113b5a3/MARC-46-2500115-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/663c/12183146/8962d1d2811a/MARC-46-2500115-g001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/663c/12183146/3103fc562237/MARC-46-2500115-g006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/663c/12183146/3d200e0226f3/MARC-46-2500115-g005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/663c/12183146/bd39c37fb3ad/MARC-46-2500115-g011.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/663c/12183146/90fb2f2c943e/MARC-46-2500115-g008.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/663c/12183146/2c123e7107e2/MARC-46-2500115-g009.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/663c/12183146/ecf01d807fe6/MARC-46-2500115-g007.jpg

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