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混合聚合物中受蛾眼启发的抗反射结构:深度可变蚀刻技术、光学性能、热稳定性和疏水性

Moth-Eye-Inspired Antireflective Structures in Hybrid Polymers: Depth-Variable Etching Techniques, Optical Performance, Thermal Stability, and Hydrophobicity.

作者信息

Werner Lukas, Diao Zhaolu, Spatz Joachim P, Abend Marcus, Resche Steffen, Hagen Nico, Busch Richard, Brunner Robert

机构信息

Department SciTec, University of Applied Sciences Jena, Carl-Zeiss-Promenade 2, 07745 Jena, Germany.

Institute of Nanostructure Technologies and Analytics (INA), Technological Electronics Department, University of Kassel, Heinrich-Plett-Straße 40, 34132 Kassel, Germany.

出版信息

Nanomaterials (Basel). 2025 Mar 25;15(7):490. doi: 10.3390/nano15070490.

Abstract

Hybrid polymers combine the benefits of inorganic and organic material properties, offering superior thermal, mechanical, and chemical stability, making them ideal for optical applications. This study focuses on the fabrication and characterization of antireflective (AR) structures within hybrid polymers using reactive ion etching (RIE). The etching process produces nanopillars with controlled heights, achieving excellent AR performance across a broad spectral range from 450 nm to 2 µm. Optical characterization, including angle-resolved transmission and reflection measurements, shows that the structured samples maintain high transmission efficiency and reduced reflectance at varying incidence angles. Thermal stability tests reveal that the AR structures preserve their optical properties after exposure to temperatures up to 250 °C. Higher temperatures cause significant material yellowing, which is attributed to changes in the bulk material rather than damage to the structured surface. Hydrophobicity measurements show significant water repellency in structured samples, with contact angles more than twice those of unstructured layers. These findings highlight the potential of hybrid polymers with moth-eye-inspired nanostructures for high-performance, durable optical components in demanding environments.

摘要

杂化聚合物结合了无机和有机材料特性的优点,具有卓越的热稳定性、机械稳定性和化学稳定性,使其成为光学应用的理想材料。本研究聚焦于使用反应离子蚀刻(RIE)在杂化聚合物中制备抗反射(AR)结构并对其进行表征。蚀刻过程产生高度可控的纳米柱,在450纳米至2微米的宽光谱范围内实现了优异的抗反射性能。包括角度分辨透射和反射测量在内的光学表征表明,结构化样品在不同入射角下保持高透射效率并降低反射率。热稳定性测试表明,抗反射结构在暴露于高达250°C的温度后仍能保持其光学性能。较高温度会导致材料显著变黄,这归因于块状材料的变化而非结构化表面的损坏。疏水性测量表明,结构化样品具有显著的拒水性,其接触角是未结构化层的两倍以上。这些发现突出了具有蛾眼启发式纳米结构的杂化聚合物在苛刻环境中用于高性能、耐用光学组件的潜力。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/c964/11990226/46731d1fbebb/nanomaterials-15-00490-g001.jpg

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