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阐明层错在TlGaSe中对其热电性能的作用。

Elucidating the role of stacking faults in TlGaSe on its thermoelectric properties.

作者信息

Simonian Tigran, Roy Ahin, Bajaj Akash, Dong Rui, Lei Zheng, Sofer Zdeněk, Sanvito Stefano, Nicolosi Valeria

机构信息

School of Chemistry, Trinity College Dublin, Dublin, Ireland.

Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN), Trinity College Dublin, Dublin, Ireland.

出版信息

NPJ 2D Mater Appl. 2025;9(1):46. doi: 10.1038/s41699-025-00569-x. Epub 2025 Jun 6.

Abstract

Thermoelectric materials are of great interest for heat energy harvesting applications. One such promising material is TlGaSe, a 2D-layered, -type semiconducting ternary chalcogenide. Recent reports show it can be processed as a thin film, opening the door for large-scale commercialization. However, TlGaSe is prone to stacking faults along the [001] stacking direction and their role in its thermoelectric properties has not yet been understood. Herein, TlGaSe is investigated via (scanning) transmission electron microscopy and first-principles calculations. Stacking faults are found to be present throughout the material, as density functional theory calculations reveal a low stacking fault energy of ~12 mJ m. Electron transport calculations show an enhancement of thermoelectric power factors when stacking faults are present. This implies the presence of stacking faults is key to the material's excellent thermoelectric properties along the [001] stacking direction, which can be further enhanced by doping the material to carrier concentrations of ~10cm.

摘要

热电材料在热能收集应用中备受关注。一种很有前景的材料是TlGaSe,它是一种二维层状的n型半导体三元硫族化物。最近的报道表明,它可以被加工成薄膜,为大规模商业化打开了大门。然而,TlGaSe沿[001]堆叠方向容易出现堆垛层错,其在热电性能中的作用尚未被理解。在此,通过(扫描)透射电子显微镜和第一性原理计算对TlGaSe进行了研究。发现整个材料中都存在堆垛层错,因为密度泛函理论计算显示堆垛层错能较低,约为12 mJ/m²。电子输运计算表明,当存在堆垛层错时,热电功率因子会增强。这意味着堆垛层错的存在是该材料沿[001]堆叠方向具有优异热电性能的关键,通过将材料掺杂到约10²⁰ cm⁻³的载流子浓度可以进一步增强这种性能。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/7f02/12143981/7fe8672b2ab1/41699_2025_569_Fig1_HTML.jpg

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