Nasim A, Hannan M A
Can J Genet Cytol. 1977 Jun;19(2):323-30. doi: 10.1139/g77-035.
Radiation-sensitive mutants of Schizosaccharomyces pombe, known to be refractory to UV-mutagenesis, were tested for mutability caused by treatments with chemicals and gamma rays. One such mutant (rad3) was studied over a wide range of UV doses to compare the kinetics of its mutational response to that of the wild type. All such comparisons were carried out using a forward mutation system. Data show that, unlike UV, the chemical mutagens as well as gamma rays produced mutations (although at reduced frequency), in the strains of S. pombe tested, indicating the existence of an additional mechanism(s) for chemical and gamma ray induced mutations. These observations are discussed as these relate to the pathways for repair of mutational damage in yeast.
粟酒裂殖酵母的辐射敏感突变体,已知对紫外线诱变具有抗性,对其进行化学处理和伽马射线处理所导致的突变性进行了测试。研究了其中一个这样的突变体(rad3)在广泛的紫外线剂量范围内的情况,以比较其突变反应动力学与野生型的突变反应动力学。所有这些比较都是使用正向突变系统进行的。数据表明,与紫外线不同,化学诱变剂以及伽马射线在受试的粟酒裂殖酵母菌株中产生了突变(尽管频率降低),这表明存在化学和伽马射线诱导突变的额外机制。讨论了这些观察结果与酵母中突变损伤修复途径的关系。