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对卤代水杨酰苯胺及相关化合物的光接触性皮炎。我们1967年至1975年期间的经验。

Photocontact dermatitis to halogenated salicylanilides and related compounds. Our experience between 1967 and 1975.

作者信息

Smith S Z, Epstein J H

出版信息

Arch Dermatol. 1977 Oct;113(10):1372-4.

PMID:911164
Abstract

We evaluated the role of the halogenated salicylanilides and related compounds in the development of photocontact dermatitis between 1967 and 1975 as seen at the University of California, San Francisco clinic. During this period positive photopatch tests to at least one of these chemicals were detected in 98 patients. Prior to 1967, tetrachlorosalicylanilide and the brominated salicylanilides were the most common offenders. Declines occurred in number of patients with positive photopatch tests and patch tests to these agents as well as the number of patients tested to these agents during this period; ie, almost three times as many people were tested and four times as many had positive photopatch tests in the last six months of 1967 as compared to the first nine months of 1975. The most striking reduction in numbers of patients with positive tests occurred after 1968, but the most notable reduction in the total number of positive photopatch tests occurred after 1970. We concluded that these results were most likely due to removal from the market of the more potent photosensitizing chemicals and increased physician familiarity with the disease process.

摘要

1967年至1975年期间,我们在加州大学旧金山分校诊所评估了卤化水杨酰苯胺及其相关化合物在光接触性皮炎发病中的作用。在此期间,98例患者至少对其中一种化学物质的光斑贴试验呈阳性。1967年之前,四氯水杨酰苯胺和溴化水杨酰苯胺是最常见的致病因素。在此期间,对这些药物进行光斑贴试验和斑贴试验呈阳性的患者数量以及接受这些药物检测的患者数量均有所下降;也就是说,与1975年的前九个月相比,1967年最后六个月接受检测的人数几乎是前者的三倍,光斑贴试验呈阳性的人数是前者的四倍。检测呈阳性的患者数量减少最为显著的情况发生在1968年之后,但光斑贴试验阳性总数减少最为显著的情况发生在1970年之后。我们得出结论,这些结果很可能是由于效力更强的光敏化学物质退出市场以及医生对该病病程的熟悉程度提高所致。

相似文献

1
Photocontact dermatitis to halogenated salicylanilides and related compounds. Our experience between 1967 and 1975.对卤代水杨酰苯胺及相关化合物的光接触性皮炎。我们1967年至1975年期间的经验。
Arch Dermatol. 1977 Oct;113(10):1372-4.
2
Photoallergic contact dermatitis. Due to halogenated salicylanilides and related compounds.光变应性接触性皮炎。由卤化水杨酰苯胺及相关化合物引起。
Arch Dermatol. 1966 Sep;94(3):255-62. doi: 10.1001/archderm.94.3.255.
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Photodermatitis from halogenated salicylanilides in Germany.德国卤化水杨酰苯胺引起的光性皮炎。
Contact Dermatitis. 1975 Aug;1(4):263. doi: 10.1111/j.1600-0536.1975.tb05421.x.
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Delayed reactions in positive photopatch tests to halogenated salicylanilides.卤化水杨酰苯胺阳性光斑试验中的延迟反应。
Arch Dermatol. 1967 Jul;96(1):59-61.
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[Photoallergy: results of photo patch testing in dermatological patients (author's transl)].[光变应性:皮肤科患者光斑贴试验结果(作者译)]
Wien Klin Wochenschr. 1977 Mar 18;89(6):185-92.
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[Photocontact dermatitis due to ketoprofen and photosensitization to tetrachlorosalicylanide and to Fenticlor(R)].[酮洛芬引起的光接触性皮炎以及对四氯水杨苯胺和芬替克洛(商品名)的光敏反应]
Ann Dermatol Venereol. 2002 Oct;129(10 Pt 1):1125-7.
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Allergic contact dermatitis to bromsalicylchloranilide.对溴水杨氯苯胺的变应性接触性皮炎
Contact Dermatitis. 1986 May;14(5):319. doi: 10.1111/j.1600-0536.1986.tb05290.x.
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The action spectrum of photocontact dermatitis caused by halogenated salicylanilide and related compounds.卤代水杨酰苯胺及相关化合物引起的光接触性皮炎的作用光谱。
Arch Dermatol. 1968 Feb;97(2):130-6.
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Contact photo-allergy to tribromsalicylanilide.对三溴水杨酰苯胺的接触性光变应性反应。
Boll Chim Farm. 1971 Oct;110(10):590-4.
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Contact and photocontact allergy to sunscreens.对防晒霜的接触性和光接触性过敏。
Photodermatol. 1984 Feb;1(1):5-9.

引用本文的文献

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Photosensitivity due to drugs.药物引起的光敏性。
Drugs. 1985 Jul;30(1):42-57. doi: 10.2165/00003495-198530010-00005.