Cyster L A, Grant D M, Parker K G, Parker T L
Biomaterials Group, School of MMMEM, University of Nottingham, Nottingham, NG7 2RD, UK.
Biomol Eng. 2002 Aug;19(2-6):171-5. doi: 10.1016/s1389-0344(02)00021-7.
Thin films of TiN were investigated as a candidate microelectrode material for multi-electrode arrays, which are used for recording from electrically active cells in culture. TiN films were deposited onto glass substrates by DC pulsed reactive magnetron sputtering. The structure, phase composition and surface chemistry were studied using X-ray diffraction (XRD), Atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS). The biocompatibility of the TiN films was examined morphologically by monitoring neuronal network formation and comparing this to a control substrate. Results indicate that neuronal cell adhesion and growth is influenced by the surface chemistry and associated crystal orientation of the TiN thin films.
氮化钛薄膜作为用于多电极阵列的候选微电极材料进行了研究，多电极阵列用于记录培养中的电活性细胞。通过直流脉冲反应磁控溅射将氮化钛薄膜沉积在玻璃基板上。使用X射线衍射（XRD）、原子力显微镜（AFM）和X射线光电子能谱（XPS）研究了其结构、相组成和表面化学。通过监测神经网络的形成并与对照基板进行比较，从形态学上检查了氮化钛薄膜的生物相容性。结果表明，神经元细胞的粘附和生长受氮化钛薄膜的表面化学和相关晶体取向的影响。
