WCU Hybrid Materials Program, Department of Materials Science and Engineering, Seoul National University, Seoul, 151-744, Korea.
J Mater Sci Mater Med. 2011 Oct;22(10):2231-7. doi: 10.1007/s10856-011-4410-8. Epub 2011 Aug 13.
This study reports the deposition of TiN films on Co-Cr substrates to improve the substrates' mechanical properties and biological properties. In particular, the argon to nitrogen (Ar:N(2)) gas flow ratio was adjusted to control the microstructure of the TiN films. A Ti interlayer was also used to enhance the adhesion strength between the Co-Cr substrate and TiN films. A series of TiN films, which are denoted as TiN-(Ar/N(2))1:1, Ti/TiN-(Ar/N(2))1:1, and Ti/TiN-(Ar:N(2))1:3, were deposited by reactive DC sputtering. All the deposited TiN films showed a dense, columnar structure with a preferential orientation of the (200) plane. These TiN films increased the mechanical properties of Co-Cr, such as the critical load during scratch testing, hardness, elastic modulus and plastic resistance. In addition, the biological properties of the Co-Cr substrates, i.e. initial attachment, proliferation, and cellular differentiation of the MC3T3-E1 cells, were improved considerably by deposition of the TiN films. These results suggest that TiN films would effectively enhance both the mechanical properties and biocompatibility of biomedical Co-Cr alloys.
本研究报告了在 Co-Cr 基底上沉积 TiN 薄膜以改善基底机械性能和生物性能。具体来说，通过调整氩气与氮气（Ar:N(2)）的流量比来控制 TiN 薄膜的微观结构。还使用了 Ti 中间层来增强 Co-Cr 基底与 TiN 薄膜之间的附着强度。通过反应性直流溅射沉积了一系列 TiN 薄膜，分别表示为 TiN-(Ar/N(2))1:1、Ti/TiN-(Ar/N(2))1:1 和 Ti/TiN-(Ar:N(2))1:3。所有沉积的 TiN 薄膜均表现出致密的柱状结构，具有（200）面的择优取向。这些 TiN 薄膜提高了 Co-Cr 的机械性能，例如划痕测试中的临界载荷、硬度、弹性模量和塑性阻力。此外，TiN 薄膜的沉积还显著改善了 Co-Cr 基底的生物性能，即 MC3T3-E1 细胞的初始附着、增殖和细胞分化。这些结果表明，TiN 薄膜将有效地提高生物医学 Co-Cr 合金的机械性能和生物相容性。
