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博来霉素对酿酒酵母生长动力学和存活率的影响:修复途径模型

Effects of bleomycin on growth kinetics and survival of Saccharomyces cerevisiae: a model of repair pathways.

作者信息

Keszenman D J, Salvo V A, Nunes E

机构信息

Departamento de Biofísica, Facultad de Medicinia, Universidad de la República, Montevideo, Uruguay.

出版信息

J Bacteriol. 1992 May;174(10):3125-32. doi: 10.1128/jb.174.10.3125-3132.1992.

Abstract

In order to analyze the roles of some repair genes in the processing of bleomycin-induced DNA damage and, especially, the interrelationships among the involved repair pathways, we investigated the potentially lethal effect of bleomycin on radiosensitive mutants of Saccharomyces cerevisiae defective in recombination, excision, and RAD6-dependent DNA repair. Using single, double, and triple rad mutants, we analyzed growth kinetics and survival curves as a function of bleomycin concentration. Our results indicate that genes belonging to the three epistasis groups interact in the repair of bleomycin-induced DNA damage to different degrees depending on the concentration of bleomycin. The most important mechanisms involved are recombination and postreplication repair. The initial action of a potentially inducible excision repair gene could provide intermediate substrates for the RAD6- and RAD52-dependent repair processes. Interaction between RAD6 and RAD52 genes was epistatic for low bleomycin concentrations. RAD3 and RAD52 genes act independently in processing DNA damage induced by high concentrations of bleomycin. The synergistic interaction observed at high concentrations in the triple mutant rad2-6 rad6-1 rad52-1 indicates partial independence of the involved repair pathways, with possible common substrates. On the basis of the present results, we propose a heuristic model of bleomycin-induced DNA damage repair.

摘要

为了分析一些修复基因在博来霉素诱导的DNA损伤处理中的作用,特别是所涉及的修复途径之间的相互关系,我们研究了博来霉素对酿酒酵母中在重组、切除和RAD6依赖性DNA修复方面存在缺陷的辐射敏感突变体的潜在致死效应。使用单、双和三rad突变体,我们分析了生长动力学和存活曲线作为博来霉素浓度的函数。我们的结果表明,属于三个上位性组的基因在博来霉素诱导的DNA损伤修复中根据博来霉素的浓度不同程度地相互作用。涉及的最重要机制是重组和复制后修复。一个潜在可诱导的切除修复基因的初始作用可以为RAD6和RAD52依赖性修复过程提供中间底物。对于低浓度的博来霉素,RAD6和RAD52基因之间的相互作用是上位性的。RAD3和RAD52基因在处理高浓度博来霉素诱导的DNA损伤时独立起作用。在三突变体rad2 - 6 rad6 - 1 rad52 - 1中高浓度下观察到的协同相互作用表明所涉及的修复途径部分独立,可能有共同的底物。基于目前的结果,我们提出了一个博来霉素诱导的DNA损伤修复的启发式模型。

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