Zaouk Rabih, Park Benjamin Y, Madou Marc J
Department of Mechanical Engineering, University of California-Irvine, USA.
Methods Mol Biol. 2006;321:5-15. doi: 10.1385/1-59259-997-4:3.
The advent of photolithography literally brought about the integrated circuit (IC) revolution of the latter part of the twentieth century. Almost all electronic devices that we use today have one or more ICs inside. Improving lithography techniques led to smaller and smaller transistors, which translated into faster and more efficient computing machines. Photolithography also powered the advent of MicroElectroMechanical Systems (MEMS), which are now starting to become more and more diverse in commercial products from mechanical to biomedical devices, helping to change the way people perceive the applicability of IC technology. In this chapter, we examine basic photolithography techniques and their uses in soft lithography and MEMS.
光刻技术的出现切实引发了20世纪后半叶的集成电路（IC）革命。如今我们使用的几乎所有电子设备内部都有一个或多个集成电路。光刻技术的不断改进使得晶体管越来越小，这进而带来了运算速度更快、效率更高的计算机。光刻技术还推动了微机电系统（MEMS）的出现，如今微机电系统在从机械装置到生物医学设备等商业产品中开始变得越来越多样化，有助于改变人们对集成电路技术适用性的看法。在本章中，我们将研究基本的光刻技术及其在软光刻和微机电系统中的应用。
