Science. 1992 Jul 17;257(5068):375-7. doi: 10.1126/science.257.5068.375.
An atomic force microscope (AFM) has been used to machine complex patterns and to form free structural objects in thin layers of MoO(3) grown on the surface of MoS(2). The AFM tip can pattern lines with </=10-nanometer resolution and then image the resulting structure without perturbation by controlling the applied load. Distinct MoO(3) structures can also be defined by AFM machining, and furthermore these objects can be manipulated on the MoS(2) substrate surface with the AFM tip. These results suggest application to nanometer-scale diffraction gratings, high-resolution lithography masks, and possibly the assembly of nanostructures with novel properties.
原子力显微镜(AFM)已被用于加工复杂图案,并在 MoS2表面生长的 MoO3薄层中形成自由结构物体。通过控制施加的负载,AFM 探针可以以 </=10 纳米的分辨率对线条进行图案化,然后对所得结构进行成像而不会产生干扰。通过 AFM 加工也可以定义明显的 MoO3结构,此外,这些物体可以用 AFM 探针在 MoS2衬底表面上进行操作。这些结果表明可以应用于纳米级衍射光栅、高分辨率光刻掩模,以及可能的具有新型特性的纳米结构组装。