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反射硬 X 射线光学焦斑波场的相衬表征。

Ptychographic characterization of the wavefield in the focus of reflective hard X-ray optics.

机构信息

Paul Scherrer Institut, CH-5232 Villigen PSI, Switzerland.

出版信息

Ultramicroscopy. 2010 Mar;110(4):325-9. doi: 10.1016/j.ultramic.2010.01.004. Epub 2010 Jan 21.

DOI:10.1016/j.ultramic.2010.01.004
PMID:20116927
Abstract

A technique for quantitatively characterizing the complex-valued focal wavefield of arbitrary optics is described and applied to reconstructing the coherent focused beam produced by a reflective/diffractive hard X-ray mirror. This phase-retrieval method, based on ptychography, represents an important advance in X-ray optics characterization because the information obtained and potential resolution far exceeds that accessible to methods of directly probing the focus. Ptychography will therefore be well-suited for characterizing and aligning future nanofocusing X-ray optics.

摘要

描述了一种定量描述任意光学系统复值焦场的技术,并将其应用于重建反射/衍射硬 X 射线镜产生的相干聚焦光束。这种基于相衬术的相位恢复方法是 X 射线光学特性表征的重要进展,因为获得的信息和潜在的分辨率远远超过直接探测焦点的方法。因此,相衬术非常适合于未来的纳米聚焦 X 射线光学元件的特性描述和对准。

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