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基于高分辨率 PFPE 的纳米制造技术,用于高图案密度、20nm 以下特征的微纳结构成型:一种基础材料方法。

High-resolution PFPE-based molding techniques for nanofabrication of high-pattern density, sub-20 nm features: a fundamental materials approach.

机构信息

Department of Chemistry, University of North Carolina at Chapel Hill, Chapel Hill, North Carolina 27599, USA.

出版信息

Nano Lett. 2010 Apr 14;10(4):1421-8. doi: 10.1021/nl100326q.

Abstract

Several perfluoropolyether (PFPE)-based elastomers for high-resolution replica molding applications are explored. The modulus of the elastomeric materials was increased through synthetic and additive approaches while maintaining relatively low surface tension values (<25 mN/m). Using large area (>4 in.(2)) master templates, we experimentally show the relationship between mold resolution and material properties such as modulus and surface tension for materials used in this study. A composite mold approach was used to form flexible molds out of stiff, high modulus materials that allow for replication of sub-20 nm post structures. Sub-100 nm line grating master templates, formed using e-beam lithography, were used to determine the experimental stability of the molding materials. It was observed that as the feature spacing decreased, high modulus PFPE tetramethacrylate (TMA) composite molds were able to effectively replicate the nanograting structures without cracking or tear-out defects that typically occur with high modulus elastomers.

摘要

探索了几种用于高分辨率复制成型应用的全氟聚醚(PFPE)基弹性体。通过合成和添加剂方法来提高弹性体材料的模量,同时保持相对较低的表面张力值(<25 mN/m)。使用大面积(>4 英寸 2)母版,我们实验性地展示了用于本研究的材料的模塑分辨率与模量和表面张力等材料特性之间的关系。采用复合模具方法,由刚性、高模量材料形成柔性模具,允许复制亚 20nm 的柱结构。使用电子束光刻形成的亚 100nm 线光栅母版,用于确定成型材料的实验稳定性。观察到,随着特征间距的减小,高模量 PFPE 四甲基丙烯酸酯(TMA)复合材料模具能够有效地复制纳米光栅结构,而不会出现通常发生在高模量弹性体中的裂纹或撕裂缺陷。

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