Colomb Tristan, Krivec Stefan, Hutter Herbert, Akatay Ahmet Ata, Pavillon Nicolas, Montfort Frédéric, Cuche Etienne, Kühn Jonas, Depeursinge Christian, Emery Yves
Lyncée Tec SA, PSE-A, CH-1015 Lausanne, Switzerland.
Opt Express. 2010 Feb 15;18(4):3719-31. doi: 10.1364/OE.18.003719.
Digital holographic microscopy (DHM) is an interferometric technique that allows real-time imaging of the entire complex optical wavefront (amplitude and phase) reflected by or transmitted through a sample. To our knowledge, only the quantitative phase is exploited to measure topography, assuming homogeneous material sample and a single reflection on the surface of the sample. In this paper, dual-wavelength DHM measurements are interpreted using a model of reflected wave propagation through a three-interfaces specimen (2 layers deposited on a semi-infinite layer), to measure simultaneously topography, layer thicknesses and refractive indices of micro-structures. We demonstrate this DHM reflectometry technique by comparing DHM and profilometer measurement of home-made SiO(2)/Si targets and Secondary Ion Mass Spectrometry (SIMS) sputter craters on specimen including different multiple layers.
数字全息显微镜(DHM)是一种干涉技术,可对样品反射或透射的整个复杂光波前(振幅和相位)进行实时成像。据我们所知,在假设材料样品均匀且样品表面只有一次反射的情况下,仅利用定量相位来测量形貌。在本文中,通过一个反射波在三界面样品(沉积在半无限层上的两层)中传播的模型来解释双波长DHM测量,以同时测量微结构的形貌、层厚度和折射率。我们通过比较DHM与自制SiO(2)/Si靶标的轮廓仪测量结果以及包括不同多层的样品上的二次离子质谱(SIMS)溅射坑,来演示这种DHM反射测量技术。